Issued Patents All Time
Showing 1–25 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8817260 | Modulated reflectance measurement system using UV probe | Jon Opsal, Lena Nicolaides, Alex Salnik | 2014-08-26 |
| 7646486 | Modulated reflectance measurement system using UV probe | Jon Opsal, Lena Nicolaides, Alex Salnik | 2010-01-12 |
| 7362441 | Modulated reflectance measurement system using UV probe | Jon Opsal, Lena Nicolaides, Alex Salnik | 2008-04-22 |
| 7286243 | Beam profile complex reflectance system and method for thin film and critical dimension measurements | — | 2007-10-23 |
| 7248375 | Critical dimension analysis with simultaneous multiple angle of incidence measurements | Jon Opsal | 2007-07-24 |
| 7126690 | Modulated reflectance measurement system using UV probe | Jon Opsal, Lena Nicolaides, Alex Salnik | 2006-10-24 |
| 7068370 | Optical inspection equipment for semiconductor wafers with precleaning | Lanhua Wei | 2006-06-27 |
| 7061627 | Optical scatterometry of asymmetric lines and structures | Jon Opsal | 2006-06-13 |
| 6972852 | Critical dimension analysis with simultaneous multiple angle of incidence measurements | Jon Opsal | 2005-12-06 |
| 6930771 | Optical inspection equipment for semiconductor wafers with precleaning | Lanhua Wei | 2005-08-16 |
| 6922244 | Thin film optical measurement system and method with calibrating ellipsometer | Jon Opsal | 2005-07-26 |
| 6894781 | Monitoring temperature and sample characteristics using a rotating compensator ellipsometer | Lanhua Wei, Jon Opsal | 2005-05-17 |
| 6842259 | Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements | Jon Opsal | 2005-01-11 |
| 6829057 | Critical dimension analysis with simultaneous multiple angle of incidence measurements | Jon Opsal | 2004-12-07 |
| 6813034 | Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements | Jon Opsal | 2004-11-02 |
| 6781692 | Method of monitoring the fabrication of thin film layers forming a DWDM filter | — | 2004-08-24 |
| 6774997 | Apparatus for analyzing multi-layer thin film stacks on semiconductors | Jon Opsal | 2004-08-10 |
| 6754305 | Measurement of thin films and barrier layers on patterned wafers with X-ray reflectometry | Jon Opsal | 2004-06-22 |
| 6714300 | Optical inspection equipment for semiconductor wafers with precleaning | Lanhua Wei | 2004-03-30 |
| 6678349 | Apparatus for analyzing samples using combined thermal wave and X-ray reflectance measurements | Jon Opsal | 2004-01-13 |
| 6654131 | Critical dimension analysis with simultaneous multiple angle of incidence measurements | Jon Opsal | 2003-11-25 |
| 6608689 | Combination thin-film stress and thickness measurement device | Lanhua Wei, Jon Opsal | 2003-08-19 |
| 6583875 | Monitoring temperature and sample characteristics using a rotating compensator ellipsometer | Lanhua Wei, Jon Opsal | 2003-06-24 |
| 6567213 | Apparatus for analyzing multi-layer thin film stacks on semiconductors | Jon Opsal | 2003-05-20 |
| 6512815 | Apparatus for analyzing samples using combined thermal wave and X-ray reflectance measurements | Jon Opsal | 2003-01-28 |