Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6429943 | Critical dimension analysis with simultaneous multiple angle of incidence measurements | Jon Opsal | 2002-08-06 |
| 6417921 | Apparatus for analyzing multi-layer thin film stacks on semiconductors | Jon Opsal | 2002-07-09 |
| 6408048 | Apparatus for analyzing samples using combined thermal wave and X-ray reflectance measurements | Jon Opsal | 2002-06-18 |
| 6297880 | Apparatus for analyzing multi-layer thin film stacks on semiconductors | Jon Opsal | 2001-10-02 |
| 6278519 | Apparatus for analyzing multi-layer thin film stacks on semiconductors | Jon Opsal | 2001-08-21 |
| 5657754 | Apparatus for non-invasive analyses of biological compounds | — | 1997-08-19 |
| 5596406 | Sample characteristic analysis utilizing multi wavelength and multi angle polarization and magnitude change detection | David L. Willenborg | 1997-01-21 |
| 5412473 | Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices | David L. Willenborg | 1995-05-02 |
| 5228776 | Apparatus for evaluating thermal and electrical characteristics in a sample | Walter Lee Smith, Clifford G. Wells | 1993-07-20 |
| 5181080 | Method and apparatus for evaluating the thickness of thin films | Jeffrey T. Fanton, Jon Opsal | 1993-01-19 |
| 5159412 | Optical measurement device with enhanced sensitivity | David L. Willenborg, Jon Opsal | 1992-10-27 |
| 5149978 | Apparatus for measuring grain sizes in metalized layers | Jon Opsal | 1992-09-22 |
| 5042951 | High resolution ellipsometric apparatus | Nathan Gold, David L. Willenborg, Jon Opsal | 1991-08-27 |
| 5042952 | Method and apparatus for evaluating surface and subsurface and subsurface features in a semiconductor | Jon Opsal, Walter Lee Smith | 1991-08-27 |
| 4999014 | Method and apparatus for measuring thickness of thin films | Nathan Gold, David L. Willenborg, Jon Opsal | 1991-03-12 |
| 4952063 | Method and apparatus for evaluating surface and subsurface features in a semiconductor | Jon Opsal, Walter Lee Smith | 1990-08-28 |
| 4854710 | Method and apparatus for evaluating surface and subsurface features in a semiconductor | Jon Opsal, Walter Lee Smith | 1989-08-08 |
| 4795260 | Apparatus for locating and testing areas of interest on a workpiece | John Schuur, David L. Willenborg, Michael W. Taylor | 1989-01-03 |
| 4750822 | Method and apparatus for optically detecting surface states in materials | Jon Opsal, Walter Lee Smith | 1988-06-14 |
| 4679946 | Evaluating both thickness and compositional variables in a thin film sample | Jon Opsal | 1987-07-14 |
| 4636088 | Method and apparatus for evaluating surface conditions of a sample | Walter Lee Smith | 1987-01-13 |
| 4634290 | Method and apparatus for detecting thermal waves | Jon Opsal | 1987-01-06 |
| 4632561 | Evaluation of surface and subsurface characteristics of a sample | Jon Opsal | 1986-12-30 |
| 4579463 | Detecting thermal waves to evaluate thermal parameters | Jon Opsal, Walter Lee Smith, David L. Willenborg | 1986-04-01 |
| 4522510 | Thin film thickness measurement with thermal waves | Jon Opsal | 1985-06-11 |