Issued Patents All Time
Showing 26–31 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7030018 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2006-04-18 |
| 6935922 | Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2005-08-30 |
| 6884146 | Systems and methods for characterizing a polishing process | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2005-04-26 |
| 6866559 | Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing pad | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2005-03-15 |
| 6679755 | Chemical mechanical planarization system | Phillip R. Sommer, Paul D. Butterfield, Joshua T. Oen | 2004-01-20 |
| 6312319 | Polishing media magazine for improved polishing | Timothy James Donohue, Roger O. Williams, John A. Barber, Jr., Jon Hoshizaki, Lawrence L. Lee +1 more | 2001-11-06 |