Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9747520 | Systems and methods for enhancing inspection sensitivity of an inspection tool | Shifang Li, Sven Schwitalla, Prashant Aji, Lena Nicolaides | 2017-08-29 |
| 9658150 | System and method for semiconductor wafer inspection and metrology | Shifang Li | 2017-05-23 |
| 9645097 | In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning | Lena Nicolaides, Ben-ming Benjamin Tsai, Prashant Aji, Michael Gasvoda, Stanley Stokowski +5 more | 2017-05-09 |
| 8543557 | Evolution of library data sets | David M. Aikens, Walter Lee Smith | 2013-09-24 |
| 7639375 | Determining transmittance of a photomask using optical metrology | Sanjay K. Yedur, Shifang Li, Wei Liu, Hanyou Chu, Ying Ying Luo | 2009-12-29 |
| 7613598 | Global shape definition method for scatterometry | Jon Opsal, Hanyou Chu, Xuelong Cao | 2009-11-03 |
| 7523439 | Determining position accuracy of double exposure lithography using optical metrology | Shifang Li | 2009-04-21 |
| 7518740 | Evaluating a profile model to characterize a structure to be examined using optical metrology | Jeffrey A. Chard, Junwei Bao, Sanjay K. Yedur | 2009-04-14 |
| 7478019 | Multiple tool and structure analysis | Shahin Zangooie, Heath A. Pois, Jon Opsal | 2009-01-13 |
| 7145664 | Global shape definition method for scatterometry | Jon Opsal, Hanyou Chu, Xuelong Cao | 2006-12-05 |
| 7085676 | Feed forward critical dimension control | Jon Opsal | 2006-08-01 |
| 6989896 | Standardized sample for characterizing the performance of a scatterometer | Cheryl Staat, Jon Opsal | 2006-01-24 |
| 6898596 | Evolution of library data sets | David M. Aikens, Walter Lee Smith | 2005-05-24 |
| 6882421 | Apparatus for optical measurements of nitrogen concentration in thin films | Jon Opsal | 2005-04-19 |
| 6784993 | Apparatus for optical measurements of nitrogen concentration in thin films | Jon Opsal | 2004-08-31 |
| 6583876 | Apparatus for optical measurements of nitrogen concentration in thin films | Jon Opsal | 2003-06-24 |
| 6472238 | Evaluation of etching processes in semiconductors | — | 2002-10-29 |