Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8736275 | Alignment correction system and method of use | Robert J. Foster, Lin Zhou, Roger M. Young, Clemente Bottini | 2014-05-27 |
| 8680871 | Alignment correction system and method of use | Robert J. Foster, Lin Zhou, Roger M. Young, Clemente Bottini | 2014-03-25 |
| 8411270 | Monitoring stage alignment and related stage and calibration target | Lin Zhou, Roger M. Young, Clemente Bottini, Ronald D. Fiege | 2013-04-02 |
| 8157978 | Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer | Matthew Sendelbach, Alok Vaid | 2012-04-17 |
| 8080849 | Characterizing films using optical filter pseudo substrate | Lin Zhou, Sean D. Burns | 2011-12-20 |
| 7808657 | Wafer and stage alignment using photonic devices | Lin Zhou | 2010-10-05 |
| 7791723 | Optical measurement using fixed polarizer | Charles N. Archie, Matthew Sendelbach | 2010-09-07 |
| 7742160 | Determining angle of incidence with respect to workpiece | Clemente Bottini, Ronald D. Fiege, Roger M. Young, Lin Zhou | 2010-06-22 |
| 7646491 | Determining azimuth angle of incident beam to wafer | Roger M. Young, Lin Zhou, Clemente Bottini, Ronald D. Fiege | 2010-01-12 |
| 7592817 | Alignment correction system and method of use | Robert J. Foster, Lin Zhou, Roger M. Young, Clemente Bottini | 2009-09-22 |
| 7542136 | Flipping stage arrangement for reduced wafer contamination cross section and improved measurement accuracy and throughput | Lin Zhou, Roger M. Young, Clemente Bottini, Robert J. Foster, Ronald D. Fiege | 2009-06-02 |
| 7477365 | Optical spot geometric parameter determination using calibration targets | Roger M. Young, Lin Zhou, Clemente Bottini, Ronald D. Fiege | 2009-01-13 |
| 7478019 | Multiple tool and structure analysis | Youxian Wen, Heath A. Pois, Jon Opsal | 2009-01-13 |