Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11906451 | Method and system for non-destructive metrology of thin layers | Wei Ti Lee, Heath A. Pois, Mark Klare, Cornel Bozdog | 2024-02-20 |
| 11300948 | Process control of semiconductor fabrication based on spectra quality metrics | Taher Kagalwala, Shay Yogev, Matthew Sendelbach, Paul ISBESTER, Yoav Etzioni | 2022-04-12 |
| 10976666 | Apparatus and related method to control radiation transmission through mask pattern | Ezra D. B. Hall, Jed H. Rankin | 2021-04-13 |
| 10664638 | Measuring complex structures in semiconductor fabrication | Taher Kagalwala, Sridhar Mahendrakar, Matthew Sendelbach | 2020-05-26 |
| 10508900 | Three-dimensional scatterometry for measuring dielectric thickness | Padraig Timoney | 2019-12-17 |
| 10302414 | Scatterometry method and system | Gilad Wainreb, Etai Littwin, Michael Klots, Cornel Bozdog, Matthew Sendelbach | 2019-05-28 |
| 10121711 | Planar metrology pad adjacent a set of fins of a fin field effect transistor device | Sipeng Gu, Xiang Hu, Lokesh Subramany, Akshey Sehgal | 2018-11-06 |
| 10030971 | Measurement system and method for measuring in thin films | Cornel Bozdog, Sridhar Mahendrakar, Mainul Hossain, Taher Kagalwala | 2018-07-24 |
| 9995692 | Systems and methods of controlling a manufacturing process for a microelectronic component | Givantha Iddawela | 2018-06-12 |
| 9903707 | Three-dimensional scatterometry for measuring dielectric thickness | Padraig Timoney | 2018-02-27 |
| 9330985 | Automated hybrid metrology for semiconductor device fabrication | Ned R. Saleh, Matthew Sendelbach, Narender Rana | 2016-05-03 |
| 9281249 | Decoupling measurement of layer thicknesses of a plurality of layers of a circuit structure | Abner Bello, Sipeng Gu, Lokesh Subramany, Xiang Hu, Akshey Sehgal | 2016-03-08 |
| 9177873 | Systems and methods for fabricating semiconductor device structures | Carsten Hartig, Lokesh Subramany | 2015-11-03 |
| 9129905 | Planar metrology pad adjacent a set of fins of a fin field effect transistor device | Xiang Hu, Lokesh Subramany, Sipeng Gu, Akshey Sehgal | 2015-09-08 |
| 9121890 | Planar metrology pad adjacent a set of fins of a fin field effect transistor device | Sipeng Gu, Xiang Hu, Lokesh Subramany, Akshey Sehgal | 2015-09-01 |
| 8892237 | Systems and methods for fabricating semiconductor device structures using different metrology tools | Carsten Hartig | 2014-11-18 |
| 8869081 | Automating integrated circuit device library generation in model based metrology | Nedal Saleh | 2014-10-21 |
| 8157978 | Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer | Matthew Sendelbach, Shahin Zangooie | 2012-04-17 |
| 7838308 | Method of controlling embedded material/gate proximity | Rohit Pal, David E. Brown, Kevin R. Lensing | 2010-11-23 |
| 7682845 | Methods for calibrating a process for growing an epitaxial silicon film and methods for growing an epitaxial silicon film | Rohit Pal, Kevin R. Lensing | 2010-03-23 |