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Detection of particle contamination on wafers |
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| 9029855 |
Layout for reticle and wafer scanning electron microscope registration or overlay measurements |
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Systems and methods for fabricating semiconductor device structures using different metrology tools |
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Incorporating film optical property measurements into scatterometry metrology |
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Method of reducing contamination by removing an interlayer dielectric from the substrate edge |
Holger Schuehrer, Christin Bartsch |
2008-08-12 |
| 7259091 |
Technique for forming a passivation layer prior to depositing a barrier layer in a copper metallization layer |
Holger Schuehrer, Christin Bartsch, Kai Frohberg |
2007-08-21 |
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Matthias Schaller, Christoph Schwan |
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| 6936383 |
Method of defining the dimensions of circuit elements by using spacer deposition techniques |
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2005-08-30 |
| 6838010 |
System and method for wafer-based controlled patterning of features with critical dimensions |
Gunter Grasshoff |
2005-01-04 |
| 6724096 |
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2004-04-20 |
| 6720242 |
Method of forming a substrate contact in a field effect transistor formed over a buried insulator layer |
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