Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9817927 | Hard mask etch and dielectric etch aware overlap for via and metal layers | Yuping Ren, David N. Power, Lalit Shokeen, Chin Teong Lim, Paul Ackmann +1 more | 2017-11-14 |
| 9798238 | Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques | Arthur Hotzel, Paul Ackmann, Soon Yoeng Tan | 2017-10-24 |
| 9341961 | Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques | Arthur Hotzel, Paul Ackmann, Soon Yoeng Tan | 2016-05-17 |
| 9029855 | Layout for reticle and wafer scanning electron microscope registration or overlay measurements | Carsten Hartig, Paul Ackmann, Fanghong Gn | 2015-05-12 |