Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9947645 | Multi-project wafer with IP protection by reticle mask pattern modification | Teck Jung Tang, Ian D. Melville, Yelei Vianna Yao, Yasushi Yamagata | 2018-04-17 |
| 9798238 | Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques | Guo Xiang Ning, Arthur Hotzel, Paul Ackmann | 2017-10-24 |
| 9395621 | Pellicles and devices comprising a photomask and the pellicle | Gek Soon Chua, Ngar Chen Stella Lau, Sia Kim Tan | 2016-07-19 |
| 9341961 | Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques | Guo Xiang Ning, Arthur Hotzel, Paul Ackmann | 2016-05-17 |
| 9336345 | Methods for converting planar designs to FinFET designs in the design and fabrication of integrated circuits | Srinidhi Ramamoorthy, Angeline Ho Chye Ee, Andreas Knorr, Frank Scott Johnson | 2016-05-10 |
| 9318399 | Semiconductor wafers employing a fixed-coordinate metrology scheme and methods for fabricating integrated circuits using the same | Hui Leang Ong | 2016-04-19 |
| 9136223 | Forming alignment mark and resulting mark | Guoxiang Ning, Seok Yan Poh, Paul Ackmann | 2015-09-15 |
| 9069923 | IP protection | Teck Jung Tang, Ian D. Melville, Yelei Vianna Yao, Yasushi Yamagata | 2015-06-30 |
| 8692380 | Integrated circuit system with sub-geometry removal and method of manufacture thereof | Huey Ming Chong, Byoung Il Choi, Soo Muay Goh | 2014-04-08 |
| 8533651 | Providing conversion of a planar design to a FinFET design | Angeline Ho, Hendry Renaldo, Andreas Knorr, Scott Johnson | 2013-09-10 |
| 8293546 | Integrated circuit system with sub-geometry removal and method of manufacture thereof | Huey Ming Chong, Byoung Il Choi, Soo Muay Goh | 2012-10-23 |
| 8283193 | Integrated circuit system with sealring and method of manufacture thereof | Teck Jung Tang | 2012-10-09 |
| 8057968 | Mask and method to pattern chromeless phase lithography contact hole | Sia Kim Tan, Qun Ying Lin, Huey Ming Chong, Liang-Choo Hsia | 2011-11-15 |
| 8048588 | Method and apparatus for removing radiation side lobes | Sia Kim Tan, Qunying Lin, Huey Ming Chong, Liang-Choo Hsia | 2011-11-01 |
| 7923180 | Cross technology reticles | Sia Kim Tan, Guoxiang Ning, Gek Soon Chua, Byoung Il Choi, Jason Phua | 2011-04-12 |
| 7655388 | Mask and method to pattern chromeless phase lithography contact hole | Sia Kim Tan, Qun Ying Lin, Hury Ming Chong, Liang-Choo Hsia | 2010-02-02 |
| 7556891 | Method and apparatus for contact hole unit cell formation | Sia Kim Tan, Qunying Lin, Huey Ming Chong, Liang-Choo Hsia | 2009-07-07 |
| 7288366 | Method for dual damascene patterning with single exposure using tri-tone phase shift mask | Sia Kim Tan, Qun Ying Lin, Huey Ming Chong | 2007-10-30 |
| 7014962 | Half tone alternating phase shift masks | Qun Ying Lin, Sia Kim Tan, Huey Ming Chong | 2006-03-21 |