Issued Patents All Time
Showing 25 most recent of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11195947 | Semiconductor device with doped region adjacent isolation structure in extension region | Jagar Singh, Luigi Pantisano, Anvitha Shampur, Srikanth B. Samavedam | 2021-12-07 |
| 9336345 | Methods for converting planar designs to FinFET designs in the design and fabrication of integrated circuits | Soon Yoeng Tan, Srinidhi Ramamoorthy, Angeline Ho Chye Ee, Andreas Knorr | 2016-05-10 |
| 9257325 | Semiconductor structures and methods for forming isolation between Fin structures of FinFET devices | Andreas Knorr | 2016-02-09 |
| 9123570 | Integration scheme for changing crystal orientation in hybrid orientation technology (HOT) using direct silicon bonded (DSB) substrates | Angelo Pinto, Benjamin P. McKee, Shaofeng Yu | 2015-09-01 |
| 9000534 | Method for forming and integrating metal gate transistors having self-aligned contacts and related structure | Andreas Knorr | 2015-04-07 |
| 8912603 | Semiconductor device with stressed fin sections | Scott Luning | 2014-12-16 |
| 8865596 | Methods for forming semiconductor structures using selectively-formed sidewall spacers | — | 2014-10-21 |
| 8736061 | Integrated circuits having a continuous active area and methods for fabricating same | Olivier Menut, Marc Tarabbia, Gregory A. Northrop | 2014-05-27 |
| 8729609 | Integrated circuits including multi-gate transistors locally interconnected by continuous fin structure and methods for the fabrication thereof | Andreas Knorr | 2014-05-20 |
| 8603893 | Methods for fabricating FinFET integrated circuits on bulk semiconductor substrates | Andy Wei, Francis C. Tambwe | 2013-12-10 |
| 8558318 | Integration scheme for changing crystal orientation in hybrid orientation technology (HOT) using direct silicon bonded (DSB) substrates | Angelo Pinto, Benjamin P. McKee, Shaofeng Yu | 2013-10-15 |
| 8404592 | Methods for fabricating FinFET semiconductor devices using L-shaped spacers | Scott Luning | 2013-03-26 |
| 8383503 | Methods for forming semiconductor structures using selectively-formed sidewall spacers | — | 2013-02-26 |
| 8268727 | Methods for fabricating FinFET semiconductor devices using planarized spacers | Douglas J. Bonser | 2012-09-18 |
| 8192641 | Methods for fabricating non-planar electronic devices having sidewall spacers formed adjacent selected surfaces | — | 2012-06-05 |
| 8138045 | Method of forming sidewall spacers to reduce formation of recesses in the substrate and increase dopant retention in a semiconductor device | Mahalingam Nandakumar, Said Ghneim | 2012-03-20 |
| 8039349 | Methods for fabricating non-planar semiconductor devices having stress memory | Michael Hargrove, Scott Luning | 2011-10-18 |
| 8039326 | Methods for fabricating bulk FinFET devices having deep trench isolation | Andreas Knorr | 2011-10-18 |
| 8030144 | Semiconductor device with stressed fin sections, and related fabrication methods | Scott Luning | 2011-10-04 |
| 7985639 | Method for fabricating a semiconductor device having a semiconductive resistor structure | Douglas J. Bonser | 2011-07-26 |
| 7977174 | FinFET structures with stress-inducing source/drain-forming spacers and methods for fabricating the same | Scott Luning, Michael Hargrove | 2011-07-12 |
| 7960280 | Process method to fully salicide (FUSI) both N-poly and P-poly on a CMOS flow | Freidoon Mehrad | 2011-06-14 |
| 7960287 | Methods for fabricating FinFET structures having different channel lengths | Richard T. Schultz | 2011-06-14 |
| 7943451 | Integration scheme for reducing border region morphology in hybrid orientation technology (HOT) using direct silicon bonded (DSB) substrates | Angelo Pinto | 2011-05-17 |
| 7930656 | System and method for making photomasks | Thomas J. Aton, Carl A. Vickery, James Walter Blatchford, Benjamen M. Rathsack, Benjamin P. McKee | 2011-04-19 |