Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9395621 | Pellicles and devices comprising a photomask and the pellicle | Gek Soon Chua, Soon Yoeng Tan, Ngar Chen Stella Lau | 2016-07-19 |
| 8896810 | Liquid immersion scanning exposure system using an immersion liquid confined within a lens hood | Wenzhan Zhou, Lei Yuan, Meisheng Zhou | 2014-11-25 |
| 8413083 | Mask system employing substantially circular optical proximity correction target and method of manufacture thereof | Gek Soon Chua, Kwee Liang Yeo, Ryan Khoon Khye Chong, Moh Lung Ling | 2013-04-02 |
| 8057968 | Mask and method to pattern chromeless phase lithography contact hole | Soon Yoeng Tan, Qun Ying Lin, Huey Ming Chong, Liang-Choo Hsia | 2011-11-15 |
| 8048588 | Method and apparatus for removing radiation side lobes | Soon Yoeng Tan, Qunying Lin, Huey Ming Chong, Liang-Choo Hsia | 2011-11-01 |
| 8034543 | Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask | Gek Soon Chua, Qunying Lin, Cho Jui Tay, Chenggen Quan | 2011-10-11 |
| 8003311 | Integrated circuit system employing multiple exposure dummy patterning technology | Soo Muay Goh, Qunying Lin, Martin Yeo | 2011-08-23 |
| 7926000 | Integrated circuit system employing dipole multiple exposure | Qunying Lin | 2011-04-12 |
| 7923180 | Cross technology reticles | Guoxiang Ning, Gek Soon Chua, Soon Yoeng Tan, Byoung Il Choi, Jason Phua | 2011-04-12 |
| 7867698 | Reticle system for manufacturing integrated circuit systems | Gek Soon Chua, Byoung Il Choi, Ryan Khoon Khye Chong, Martin Yeo | 2011-01-11 |
| 7866224 | Monitoring structure | Gek Soon Chua, Qun Ying Lin, Martin Yeo | 2011-01-11 |
| 7836420 | Integrated circuit system with assist feature | Qunying Lin, Andrew Khoh | 2010-11-16 |
| 7674562 | Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask | Gek Soon Chua, Qunying Lin, Cho Jui Tay, Chenggen Quan | 2010-03-09 |
| 7655388 | Mask and method to pattern chromeless phase lithography contact hole | Soon Yoeng Tan, Qun Ying Lin, Hury Ming Chong, Liang-Choo Hsia | 2010-02-02 |
| 7649612 | Phase shifting photolithography system | Qunying Lin, Liang-Choo Hsia | 2010-01-19 |
| 7560199 | Polarizing photolithography system | Qunying Lin, Gek Soon Chua, Liang-Choo Hsia | 2009-07-14 |
| 7556891 | Method and apparatus for contact hole unit cell formation | Soon Yoeng Tan, Qunying Lin, Huey Ming Chong, Liang-Choo Hsia | 2009-07-07 |
| 7445874 | Method to resolve line end distortion for alternating phase shift mask | Qunying Lin, Liang-Choo Hsia | 2008-11-04 |
| 7421676 | System and method for phase shift assignment | Qunying Lin, Liang-Choo Hsia | 2008-09-02 |
| 7384714 | Anti-reflective sidewall coated alternating phase shift mask and fabrication method | Qunying Lin, Liang-Choo Hsia | 2008-06-10 |
| 7288366 | Method for dual damascene patterning with single exposure using tri-tone phase shift mask | Qun Ying Lin, Soon Yoeng Tan, Huey Ming Chong | 2007-10-30 |
| 7014962 | Half tone alternating phase shift masks | Qun Ying Lin, Soon Yoeng Tan, Huey Ming Chong | 2006-03-21 |