Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9972634 | Semiconductor device comprising a floating gate flash memory device | Ralf Richter, Peter Krottenthaler | 2018-05-15 |
| 9372392 | Reticles for use in forming implant masking layers and methods of forming implant masking layers | Dietmar Henke, Hans-Juergen Thees | 2016-06-21 |
| 9281200 | Enhanced patterning uniformity of gate electrodes of a semiconductor device by late gate doping | Hans-Juergen Thees, Sven Beyer, Steffen Laufer | 2016-03-08 |
| 8927407 | Method of forming self-aligned contacts for a semiconductor device | Peter Baars, Andy Wei, Erik Geiss | 2015-01-06 |
| 8802360 | Reticles for use in forming implant masking layers and methods of forming implant masking layers | Henke Dietmar, Hans-Juergen Thees | 2014-08-12 |
| 8716120 | High-k metal gate electrode structures formed by reducing a gate fill aspect ratio in replacement gate technology | Klaus Hempel, Andy Wei | 2014-05-06 |
| 8258062 | Cap layer removal in a high-K metal gate stack by using an etch process | Ralf Richter, Frank Seliger | 2012-09-04 |
| 7994059 | Enhanced stress transfer in an interlayer dielectric by using an additional stress layer above a dual stress liner in a semiconductor device | Ralf Richter, Martin Gerhardt, Joerg Hohage | 2011-08-09 |
| 7981740 | Enhanced cap layer integrity in a high-K metal gate stack by using a hard mask for offset spacer patterning | Markus Lenski, Kerstin Ruttloff, Frank Seliger, Ralf Otterbach | 2011-07-19 |
| 7938973 | Arc layer having a reduced flaking tendency and a method of manufacturing the same | Ralf Richter, Joerg Hohage | 2011-05-10 |
| 7887978 | Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions | Uwe Griebenow, Wolfram Grundke, Andre Poock | 2011-02-15 |
| 7550396 | Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device | Kai Frohberg, Volker Grimm, Sven Mueller, Matthias Lehr, Ralf Richter +4 more | 2009-06-23 |
| 7547561 | Advanced process control model incorporating a target offset term | Uwe Schulze, Andreas Becker | 2009-06-16 |
| 7314793 | Technique for controlling mechanical stress in a channel region by spacer removal | Kai Frohberg, Matthias Schaller, Massud Aminpur, Roberto Klingler | 2008-01-01 |
| 6936383 | Method of defining the dimensions of circuit elements by using spacer deposition techniques | Carsten Hartig, Georg Sulzer | 2005-08-30 |
| 6759179 | Methods and systems for controlling resist residue defects at gate layer in a semiconductor device manufacturing process | Khoi A. Phan, Jeffrey P. Erhardt, Jerry Cheng, Richard Bartlett, Anthony P. Coniglio +3 more | 2004-07-06 |
| 6649525 | Methods and systems for controlling resist residue defects at gate layer in a semiconductor device manufacturing process | Khoi A. Phan, Jeffrey P. Erhardt, Jerry Cheng, Richard Bartlett, Anthony P. Coniglio +3 more | 2003-11-18 |