Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8987103 | Multi-step deposition of a spacer material for reducing void formation in a dielectric material of a contact level of a semiconductor device | Markus Lenski, Kerstin Ruttloff, Volker Jaschke, Frank Seliger | 2015-03-24 |
| 8507351 | Dopant profile tuning for MOS devices by adapting a spacer width prior to implantation | Anthony Mowry, Markus Lenski, Guido Koerner | 2013-08-13 |
| 7981740 | Enhanced cap layer integrity in a high-K metal gate stack by using a hard mask for offset spacer patterning | Markus Lenski, Kerstin Ruttloff, Martin Mazur, Frank Seliger | 2011-07-19 |
| 7977179 | Dopant profile tuning for MOS devices by adapting a spacer width prior to implantation | Anthony Mowry, Markus Lenski, Guido Koerner | 2011-07-12 |