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Method for operating a container treatment system with fault diagnosis |
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2019-11-26 |
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Enhancing transistor performance by reducing exposure to oxygen plasma in a dual stress liner approach |
Ronald G. Naumann, Andrey Zakharov, Ralf Richter |
2016-04-19 |
| 9070639 |
Shrinkage of critical dimensions in a semiconductor device by selective growth of a mask material |
Dmytro Chumakov |
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| 9006114 |
Method for selectively removing a spacer in a dual stress liner approach |
Kai Frohberg, Heike Salz, Heike Berthold |
2015-04-14 |
| 8869636 |
Method and apparatus for checking gripping elements |
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2014-10-28 |
| 7816273 |
Technique for removing resist material after high dose implantation in a semiconductor device |
Christian Krueger, Lutz Eckart |
2010-10-19 |
| 7763507 |
Stressed interlayer dielectric with reduced probability for void generation in a semiconductor device by using an intermediate etch control layer of increased thickness |
Ralf Richter, Thorsten Kammler, Heike Salz |
2010-07-27 |
| 7550396 |
Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device |
Kai Frohberg, Sven Mueller, Matthias Lehr, Ralf Richter, Jochen Klais +4 more |
2009-06-23 |
| 7166530 |
Method of forming contact pads |
Ronald G. Naumann, Tino Meinhold |
2007-01-23 |
| 6969676 |
Method of adjusting etch selectivity by adapting aspect ratios in a multi-level etch process |
Christoph Schwan, Gunter Grasshoff |
2005-11-29 |
| 6897114 |
Methods of forming a transistor having a recessed gate electrode structure |
Christian Krueger, Thomas Feudel |
2005-05-24 |
