Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10489263 | Method for operating a container treatment system with fault diagnosis | — | 2019-11-26 |
| 9318345 | Enhancing transistor performance by reducing exposure to oxygen plasma in a dual stress liner approach | Ronald G. Naumann, Andrey Zakharov, Ralf Richter | 2016-04-19 |
| 9070639 | Shrinkage of critical dimensions in a semiconductor device by selective growth of a mask material | Dmytro Chumakov | 2015-06-30 |
| 9006114 | Method for selectively removing a spacer in a dual stress liner approach | Kai Frohberg, Heike Salz, Heike Berthold | 2015-04-14 |
| 8869636 | Method and apparatus for checking gripping elements | — | 2014-10-28 |
| 7816273 | Technique for removing resist material after high dose implantation in a semiconductor device | Christian Krueger, Lutz Eckart | 2010-10-19 |
| 7763507 | Stressed interlayer dielectric with reduced probability for void generation in a semiconductor device by using an intermediate etch control layer of increased thickness | Ralf Richter, Thorsten Kammler, Heike Salz | 2010-07-27 |
| 7550396 | Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device | Kai Frohberg, Sven Mueller, Matthias Lehr, Ralf Richter, Jochen Klais +4 more | 2009-06-23 |
| 7166530 | Method of forming contact pads | Ronald G. Naumann, Tino Meinhold | 2007-01-23 |
| 6969676 | Method of adjusting etch selectivity by adapting aspect ratios in a multi-level etch process | Christoph Schwan, Gunter Grasshoff | 2005-11-29 |
| 6897114 | Methods of forming a transistor having a recessed gate electrode structure | Christian Krueger, Thomas Feudel | 2005-05-24 |