Heike Salz — 12 Patents at AMD

Heike Salz has been granted 12 US patents while listed as an inventor at AMD. The first was granted in 2008 and the most recent in April 2015. Heike Salz ranks #396,045 of 4,157,543 US inventors in our database (top 9.5%). Patent records list Heike Salz in Radebeul, DE.

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Showing 1–12 of 12 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
9006114	Method for selectively removing a spacer in a dual stress liner approach	Kai Frohberg, Volker Grimm, Heike Berthold	2015-04-14	$1,171,000
8390127	Contact trenches for enhancing stress transfer in closely spaced transistors	Andy Wei, Jan Hoentschel	2013-03-05	$2,179,000
8338314	Technique for reducing topography-related irregularities during the patterning of a dielectric material in a contact level of closely spaced transistors	Ralf Richter, Robert Seidel	2012-12-25
8034726	Interlayer dielectric material in a semiconductor device comprising a doublet structure of stressed materials	Ralf Richter, Michael Finken, Joerg Hohage	2011-10-11	$4,727,000
7883629	Technique for patterning differently stressed layers formed above transistors by enhanced etch control strategies	Matthias Schaller, Ralf Richter, Sylvio Mattick	2011-02-08	$6,374,000
7763507	Stressed interlayer dielectric with reduced probability for void generation in a semiconductor device by using an intermediate etch control layer of increased thickness	Ralf Richter, Thorsten Kammler, Volker Grimm	2010-07-27	$6,860,000
7700377	Method for reducing etch-induced process uniformities by omitting deposition of an endpoint detection layer during patterning of stressed overlayers in a semiconductor device	Ralf Richter, Matthias Schaller	2010-04-20	$17,225,000
7678690	Semiconductor device comprising a contact structure with increased etch selectivity	Ralf Richter, Carsten Peters, Matthias Schaller	2010-03-16	$8,771,000
7608501	Technique for creating different mechanical strain by forming a contact etch stop layer stack having differently modified intrinsic stress	Kai Frohberg, Carsten Peters, Matthias Schaller	2009-10-27	$8,132,000
7550396	Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device	Kai Frohberg, Volker Grimm, Sven Mueller, Matthias Lehr, Ralf Richter +4 more	2009-06-23	$21,858,000
7482219	Technique for creating different mechanical strain by a contact etch stop layer stack with an intermediate etch stop layer	Kai Frohberg, Carsten Peters, Matthias Schaller	2009-01-27	$7,357,000
7416973	Method of increasing the etch selectivity in a contact structure of semiconductor devices	Carsten Peters, Ralf Richter, Matthias Schaller	2008-08-26	$4,862,000

Heike Salz — 12 Patents

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