Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Technique for creating different mechanical strain by forming a contact etch stop layer stack having differently modified intrinsic stress

Technique for creating different mechanical strain by forming a contact etch stop layer stack having differently modified intrinsic stress

US Patent 7608501 · Granted Oct 27, 2009

Estimated economic value: $8,132,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Portable power tool2025
Drill for chiselling rock2023
Manufacturing process, tool stand, and drill bit2023
Chisel2022
Control method and borehole flushing module2021
Semiconductor devices having silicon/germanium active regions with different ger2021
Manufacturing process, tool stand, and drill bit2021
Control method and portable power tool2021
Semiconductor devices including Si/Ge active regions with different Ge concentra2019
Front-end-of-line device structure and method of forming such a front-end-of-lin2019
Twist drill and production method2019
Twist drill and production method2019