Issued Patents All Time
Showing 25 most recent of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8623742 | Reduced STI loss for superior surface planarity of embedded stressors in densely packed semiconductor devices | Stephan Kronholz, Matthias Kessler | 2014-01-07 |
| 8586440 | Methods for fabricating integrated circuits using non-oxidizing resist removal | Stefan Flachowsky, Steven Langdon | 2013-11-19 |
| 8541885 | Technique for enhancing transistor performance by transistor specific contact design | Martin Gerhardt, Ralf Richter, Uwe Griebenow | 2013-09-24 |
| 8338885 | Technique for enhancing dopant profile and channel conductivity by millisecond anneal processes | Jan Hoentschel, Ralf Illgen | 2012-12-25 |
| 8288256 | Enhancing transistor characteristics by a late deep implantation in combination with a diffusion-free anneal process | Rolf Stephan, Manfred Horstmann | 2012-10-16 |
| 8183605 | Reducing transistor junction capacitance by recessing drain and source regions | Markus Lenski, Andreas Gehring | 2012-05-22 |
| 8143133 | Technique for enhancing dopant profile and channel conductivity by millisecond anneal processes | Jan Hoentschel, Ralf Illgen | 2012-03-27 |
| 7964970 | Technique for enhancing transistor performance by transistor specific contact design | Martin Gerhardt, Ralf Richter, Uwe Griebenow | 2011-06-21 |
| 7955937 | Method for manufacturing semiconductor device comprising SOI transistors and bulk transistors | Karsten Wieczorek, Manfred Horstmann, Thomas J. Heller, Jr. | 2011-06-07 |
| 7816199 | Method of forming a semiconductor structure comprising an implantation of ions of a non-doping element | Manfred Horstmann, Andreas Gehring | 2010-10-19 |
| 7799682 | Transistor having a locally provided metal silicide region in contact areas and a method of forming the transistor | Sven Beyer, Patrick Press | 2010-09-21 |
| 7754556 | Reducing transistor junction capacitance by recessing drain and source regions | Markus Lenski, Andreas Gehring | 2010-07-13 |
| 7745334 | Technique for locally adapting transistor characteristics by using advanced laser/flash anneal techniques | Patrick Press, Karla Romero, Martin Trentzsch, Karsten Wieczorek, Markus Lenski +1 more | 2010-06-29 |
| 7625802 | Semiconductor device having improved halo structures and a method of forming the halo structures of a semiconductor device | Manfred Horstmann, Rolf Stephan | 2009-12-01 |
| 7494872 | Field effect transistor having a doped gate electrode with reduced gate depletion and method of forming the transistor | Karsten Wieczorek, Thorsten Kammler, Wolfgang Buchholtz | 2009-02-24 |
| 7419867 | CMOS gate structure comprising predoped semiconductor gate material with improved uniformity of dopant distribution and method of forming the structure | Karsten Wieczorek, Manfred Horstmann | 2008-09-02 |
| 7338872 | Method of depositing a layer of a material on a substrate | Christoph Schwan, Thorsten Kammler | 2008-03-04 |
| 7208397 | Transistor having an asymmetric source/drain and halo implantation region and a method of forming the same | Manfred Horstmann, Markus Lenski | 2007-04-24 |
| 6924216 | Semiconductor device having improved doping profiles and method of improving the doping profiles of a semiconductor device | Manfred Horstmann, Rolf Stephan | 2005-08-02 |
| 6905924 | Diode structure for SOI circuits | Gert Burbach, Manfred Horstmann | 2005-06-14 |
| 6897114 | Methods of forming a transistor having a recessed gate electrode structure | Christian Krueger, Volker Grimm | 2005-05-24 |
| 6849516 | Methods of forming drain/source extension structures of a field effect transistor using a doped high-k dielectric layer | Manfred Horstmann, Karsten Wieczorek, Stephan Kruegel | 2005-02-01 |
| 6846708 | Semiconductor device having improved doping profiles and a method of improving the doping profiles of a semiconductor device | Manfred Horstmann, Rolf Stephan | 2005-01-25 |
| 6821887 | Method of forming a metal silicide gate in a standard MOS process sequence | Karsten Wieczorek, Stephan Kruegel, Manfred Horstmann | 2004-11-23 |
| 6822430 | Method of assessing lateral dopant and/or charge carrier profiles | Manfred Horstmann, Rolf Stephan | 2004-11-23 |