Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8735270 | Method for making high-K metal gate electrode structures by separate removal of placeholder materials | Klaus Hempel, Sven Beyer, Markus Lenski | 2014-05-27 |
| 8697530 | Drain/source extension structure of a field effect transistor with reduced boron diffusion | Ekkehard Pruefer, Ralf van Bentum, Klaus Hempel | 2014-04-15 |
| 8048792 | Superior fill conditions in a replacement gate approach by corner rounding prior to completely removing a placeholder material | Sven Beyer, Klaus Hempel, Andreas Ott | 2011-11-01 |
| 7858526 | Method of patterning gate electrodes by reducing sidewall angles of a mask layer | Roland Stejskal, Markus Lenski | 2010-12-28 |
| 7358150 | Trench isolation structure for a semiconductor device with reduced sidewall stress and a method of manufacturing the same | Klaus Hempel, Ekkehard Pruefer | 2008-04-15 |
| 7332384 | Technique for forming a substrate having crystalline semiconductor regions of different characteristics | Wolfgang Buchholtz | 2008-02-19 |
| 6943088 | Method of manufacturing a trench isolation structure for a semiconductor device with a different degree of corner rounding | Ralf van Bentum, Gert Burbach | 2005-09-13 |
| 6849516 | Methods of forming drain/source extension structures of a field effect transistor using a doped high-k dielectric layer | Thomas Feudel, Manfred Horstmann, Karsten Wieczorek | 2005-02-01 |
| 6821887 | Method of forming a metal silicide gate in a standard MOS process sequence | Karsten Wieczorek, Manfred Horstmann, Thomas Feudel | 2004-11-23 |
| 6812115 | Method of filling an opening in a material layer with an insulating material | Karsten Wieczorek, Michael Raab | 2004-11-02 |
| 6798028 | Field effect transistor with reduced gate delay and method of fabricating the same | Manfred Horstmann, Rolf Stephan, Karsten Wieczorek | 2004-09-28 |
| 6703278 | Method of forming layers of oxide on a surface of a substrate | Karsten Wieczorek, Falk Graetsch | 2004-03-09 |
| 6566718 | Field effect transistor with an improved gate contact and method of fabricating the same | Karsten Wieczorek, Rolf Stephan, Manfred Horstmann | 2003-05-20 |