Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8697530 | Drain/source extension structure of a field effect transistor with reduced boron diffusion | Ralf van Bentum, Klaus Hempel, Stephan Kruegel | 2014-04-15 |
| 7528026 | Method for reducing silicide defects by removing contaminants prior to drain/source activation | Markus Lenski, Ralf van Bentum | 2009-05-05 |
| 7358150 | Trench isolation structure for a semiconductor device with reduced sidewall stress and a method of manufacturing the same | Klaus Hempel, Stephan Kruegel | 2008-04-15 |