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Method of forming a semiconductor structure including a ferroelectric material and semiconductor structure including a ferroelectric transistor |
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Semiconductor structure including a ferroelectric transistor and method for the formation thereof |
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Drain/source extension structure of a field effect transistor with reduced boron diffusion |
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Transistor having a channel with biaxial strain induced by silicon/germanium in the gate electrode |
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2004-08-10 |
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Multi-thickness silicon films on a single semiconductor-on-insulator (SOI) chip using simox |
— |
2003-04-15 |
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Semiconductor-on-insulator (SOI) device having source/drain silicon-germanium regions and method of manufacture |
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2002-10-15 |
