Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8796807 | Temperature monitoring in a semiconductor device by using a PN junction based on silicon/germanium materials | Rolf Stephan, Markus Forsberg, Anthony Mowry | 2014-08-05 |
| 7732291 | Semiconductor device having stressed etch stop layers of different intrinsic stress in combination with PN junctions of different design in different device regions | Joe Bloomquist, Peter Javorka, Manfred Horstmann | 2010-06-08 |
| 7354839 | Gate structure and a transistor having asymmetric spacer elements and methods of forming the same | Andy Wei, David C. Greenlaw | 2008-04-08 |
| 7354836 | Technique for forming a strained transistor by a late amorphization and disposable spacers | Jan Hoentschel, Andy Wei, Peter Javorka | 2008-04-08 |
| 7238578 | Method of forming a semiconductor structure comprising transistor elements with differently stressed channel regions | Rolf Stephan, Karsten Wieczorek, Manfred Horstmann | 2007-07-03 |
| 7005380 | Simultaneous formation of device and backside contacts on wafers having a buried insulator layer | Massud Aminpur, Christian Zistl | 2006-02-28 |
| 6943088 | Method of manufacturing a trench isolation structure for a semiconductor device with a different degree of corner rounding | Ralf van Bentum, Stephan Kruegel | 2005-09-13 |
| 6905924 | Diode structure for SOI circuits | Manfred Horstmann, Thomas Feudel | 2005-06-14 |
| 6821840 | Semiconductor device including a field effect transistor and a passive capacitor having reduced leakage current and an improved capacitance per unit area | Karsten Wieczorek, Thomas Feudel | 2004-11-23 |
| 6720242 | Method of forming a substrate contact in a field effect transistor formed over a buried insulator layer | Frank Heinlein, Johannes Groschopf, Gotthard Jungnickel, Hartmut Ruelke, Carsten Hartig | 2004-04-13 |
| 6656825 | Semiconductor device having an improved local interconnect structure and a method for forming such a device | — | 2003-12-02 |
| 6541863 | Semiconductor device having a reduced signal processing time and a method of fabricating the same | Manfred Horstmann, Karsten Wieczorek | 2003-04-01 |
| 6271122 | Method of compensating for material loss in a metal silicone layer in contacts of integrated circuit devices | Karsten Wieczorek, Michael Raab | 2001-08-07 |