Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8951901 | Superior integrity of a high-K gate stack by forming a controlled undercut on the basis of a wet chemistry | Sven Beyer, Berthold Reimer | 2015-02-10 |
| 8445344 | Uniform high-k metal gate stacks by adjusting threshold voltage for sophisticated transistors by diffusing a metal species prior to gate patterning | Richard J. Carter, Martin Trentzsch, Sven Beyer, Berthold Reimer, Robert Binder +1 more | 2013-05-21 |
| 8283232 | Enhanced etch stop capability during patterning of silicon nitride including layer stacks by providing a chemically formed oxide layer during semiconductor processing | Sven Beyer, Berthold Reimer | 2012-10-09 |
| 7897450 | Method for encapsulating a high-K gate stack by forming a liner at two different process temperatures | Fabian Koehler, Katy Schabernack | 2011-03-01 |
| 6900111 | Method of forming a thin oxide layer having improved reliability on a semiconductor surface | Karsten Wieczorek, Stephan Krügel | 2005-05-31 |
| 6875676 | Methods for producing a highly doped electrode for a field effect transistor | Karsten Wieczorek, Gunter Grasshoff | 2005-04-05 |
| 6812159 | Method of forming a low leakage dielectric layer providing an increased capacitive coupling | Karsten Wieczorek, Lutz Herrmann | 2004-11-02 |
| 6723663 | Technique for forming an oxide/nitride layer stack by controlling the nitrogen ion concentration in a nitridation plasma | Karsten Wieczorek, Lutz Herrmann | 2004-04-20 |
| 6703278 | Method of forming layers of oxide on a surface of a substrate | Karsten Wieczorek, Stephan Kruegel | 2004-03-09 |