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Home › Uniform high-k metal gate stacks by adjusting threshold voltage for sophisticated transistors by diffusing a metal species prior to gate patterning

Uniform high-k metal gate stacks by adjusting threshold voltage for sophisticated transistors by diffusing a metal species prior to gate patterning

US Patent 8445344 · Granted May 21, 2013

Estimated economic value: $4,418,000 ⓘ

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