Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8660681 | Method and system for excursion monitoring in optical lithography processes in micro device fabrication | Daniel Zschaebitz, Heike Scholtz | 2014-02-25 |
| 7977225 | Reducing implant degradation in tilted implantations by shifting implantation masks | Jan Hoentschel | 2011-07-12 |
| 7887978 | Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions | Uwe Griebenow, Martin Mazur, Wolfram Grundke | 2011-02-15 |