Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Incorporating film optical property measurements into scatterometry metrology

Incorporating film optical property measurements into scatterometry metrology

US Patent 7663766 · Granted Feb 16, 2010

Estimated economic value: $19,031,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for in-die overlay control using FEOL dummy fill layer2018
Metal track cutting in standard cell layouts2017
Systems and methods for fabricating semiconductor device structures2015
Inline residual layer detection and characterization post via post etch using CD2015
Detection of particle contamination on wafers2015
Layout for reticle and wafer scanning electron microscope registration or overla2015
Systems and methods for fabricating semiconductor device structures using differ2014
Advanced process control framework using two-dimensional image analysis2011
Scanner optimization for reduced across-chip performance variation through non-c2008
Method of reducing contamination by removing an interlayer dielectric from the s2008
Transistor gate shape metrology using multiple data sources2008
Technique for forming a passivation layer prior to depositing a barrier layer in2007