| 11885737 |
Method and system for optical characterization of patterned samples |
Dror Shafir, Gilad Barak, Shay Wolfling, Michal Haim YACHINI, Cornel Bozdog |
2024-01-30 |
|
| 11710616 |
TEM-based metrology method and system |
Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman +1 more |
2023-07-25 |
|
| 11450541 |
Metrology method and system |
Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman +1 more |
2022-09-20 |
|
| 11309162 |
TEM-based metrology method and system |
Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman +1 more |
2022-04-19 |
|
| 11300948 |
Process control of semiconductor fabrication based on spectra quality metrics |
Taher Kagalwala, Alok Vaid, Shay Yogev, Paul ISBESTER, Yoav Etzioni |
2022-04-12 |
|
| 11295969 |
Hybridization for characterization and metrology |
Gangadhara Raja Muthinti, Roy Koret, Aron Cepler, Wei Ti Lee |
2022-04-05 |
$5,706,000 |
| 10916404 |
TEM-based metrology method and system |
Vladimir Machavariani, Michael Shifrin, Daniel Kandel, Victor Kucherov, Igor Ziselman +1 more |
2021-02-09 |
$17,692,000 |
| 10876959 |
Method and system for optical characterization of patterned samples |
Dror Shafir, Gilad Barak, Shay Wolfling, Michal Haim YACHINI, Cornel Bozdog |
2020-12-29 |
$14,373,000 |
| 10664638 |
Measuring complex structures in semiconductor fabrication |
Taher Kagalwala, Sridhar Mahendrakar, Alok Vaid |
2020-05-26 |
$73,757,000 |
| 10302414 |
Scatterometry method and system |
Gilad Wainreb, Etai Littwin, Alok Vaid, Michael Klots, Cornel Bozdog |
2019-05-28 |
$4,526,000 |
| 10222710 |
Method and system for planning metrology measurements |
Niv Sarig, Charles N. Archie |
2019-03-05 |
$4,334,000 |
| 10209206 |
Method and system for determining strain distribution in a sample |
Gilad Barak, Shay Wolfling, Cornel Bozdog |
2019-02-19 |
$4,653,000 |
| 9330985 |
Automated hybrid metrology for semiconductor device fabrication |
Alok Vaid, Ned R. Saleh, Narender Rana |
2016-05-03 |
$2,239,000 |
| 8157978 |
Etching system and method for forming multiple porous semiconductor regions with different optical and structural properties on a single semiconductor wafer |
Alok Vaid, Shahin Zangooie |
2012-04-17 |
|
| 7791723 |
Optical measurement using fixed polarizer |
Charles N. Archie, Shahin Zangooie |
2010-09-07 |
$2,081,000 |
| 7760360 |
Monitoring a photolithographic process using a scatterometry target |
Charles N. Archie |
2010-07-20 |
$3,139,000 |
| 7453583 |
Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty |
Charles N. Archie, G. William Banke, Jr. |
2008-11-18 |
$4,805,000 |
| 7286247 |
Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty |
Charles N. Archie, G. William Banke, Jr. |
2007-10-23 |
$7,617,000 |
| 7265850 |
Fortified, compensated and uncompensated process-sensitive scatterometry targets |
Charles N. Archie |
2007-09-04 |
$5,939,000 |
| 7107177 |
Combining multiple reference measurement collections into a weighted reference measurement collection |
— |
2006-09-12 |
$4,301,000 |
| 6361402 |
Method for planarizing photoresist |
Donald F. Canaperi, Rangarajan Jagannathan, Mahadevaiyer Krishnan, Max G. Levy, Uma Satyendra +2 more |
2002-03-26 |
$26,805,000 |
| 6066566 |
High selectivity collar oxide etch processes |
Munir-ud-Din Naeem, Ting Wang |
2000-05-23 |
$39,585,000 |
| 6001740 |
Planarization of a non-conformal device layer in semiconductor fabrication |
Kathryn H. Varian, Dirk Tobben |
1999-12-14 |
$24,869,000 |
| 5976982 |
Methods for protecting device components from chemical mechanical polish induced defects |
Max G. Levy, Wolfgang Bergner, Bernhard Fiegl, George R. Goth, Paul C. Parries +3 more |
1999-11-02 |
$18,540,000 |
| 5880007 |
Planarization of a non-conformal device layer in semiconductor fabrication |
Kathryn H. Varian, Dirk Tobben |
1999-03-09 |
$24,110,000 |
