Issued Patents All Time
Showing 51–75 of 108 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7333200 | Overlay metrology method and apparatus using more than one grating per measurement direction | Kenneth C. Johnson | 2008-02-19 |
| 7289219 | Polarimetric scatterometry methods for critical dimension measurements of periodic structures | Adam E. Norton, Fred E. Stanke | 2007-10-30 |
| 7283237 | Overlay targets with isolated, critical-dimension features and apparatus to measure overlay | Michelle Zimmerman | 2007-10-16 |
| 7277165 | Method of characterizing flare | Bo Wu | 2007-10-02 |
| 7266800 | Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes | — | 2007-09-04 |
| 7246343 | Method for correcting position-dependent distortions in patterning of integrated circuits | Devendra Joshi, Franz Zach | 2007-07-17 |
| 7230703 | Apparatus and method for measuring overlay by diffraction gratings | Robert Shinagawa, Hsu-Ting Huang | 2007-06-12 |
| 7230704 | Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay | Hsu-Ting Huang, Kenneth C. Johnson | 2007-06-12 |
| 7224437 | Method for measuring and verifying stepper illumination | Gokhan Percin, Franz Zach | 2007-05-29 |
| 7224450 | Method and apparatus for position-dependent optical metrology calibration | Kenneth C. Johnson, Adam E. Norton, Holger Tuitje | 2007-05-29 |
| 7215419 | Method and apparatus for position-dependent optical metrology calibration | Kenneth C. Johnson, Adam E. Norton, Holger Tuitje | 2007-05-08 |
| 7193715 | Measurement of overlay using diffraction gratings when overlay exceeds the grating period | Rodney Smedt, Hsu-Ting Huang | 2007-03-20 |
| 7189481 | Characterizing flare of a projection lens | Bo Wu, Franz Zach | 2007-03-13 |
| 7170604 | Overlay metrology method and apparatus using more than one grating per measurement direction | Kenneth C. Johnson | 2007-01-30 |
| 7095496 | Method and apparatus for position-dependent optical metrology calibration | Kenneth C. Johnson, Adam E. Norton, Holger Tuitje | 2006-08-22 |
| 7088451 | Scatterometry by phase sensitive reflectometer | — | 2006-08-08 |
| 7046376 | Overlay targets with isolated, critical-dimension features and apparatus to measure overlay | — | 2006-05-16 |
| 7042569 | Overlay alignment metrology using diffraction gratings | Kenneth C. Johnson, Fred E. Stanke | 2006-05-09 |
| 6985232 | Scatterometry by phase sensitive reflectometer | — | 2006-01-10 |
| 6919724 | Method and apparatus for investigating the wall of a borehole | Philip Cheung, Andrew Hayman, Dennis Pittman | 2005-07-19 |
| 6909507 | Polarimetric scatterometry methods for critical dimension measurements of periodic structures | Adam E. Norton, Fred E. Stanke | 2005-06-21 |
| 6870617 | Accurate small-spot spectrometry systems and methods | Adam E. Norton, Fred E. Stanke, Rodney Smedt | 2005-03-22 |
| 6819426 | Overlay alignment metrology using diffraction gratings | Kenneth C. Johnson, Fred E. Stanke | 2004-11-16 |
| 6781371 | High vertical resolution antennas for NMR logging | Reza Taherian, Boqin Sun | 2004-08-24 |
| 6778273 | Polarimetric scatterometer for critical dimension measurements of periodic structures | Adam E. Norton, Fred E. Stanke | 2004-08-17 |