KJ

Kenneth C. Johnson

TL Tokyo Electron Limited: 14 patents #474 of 5,567Top 9%
LI Littell International: 8 patents #1 of 2Top 50%
TH Therma-Wave: 8 patents #13 of 60Top 25%
IL International Computers Limited: 4 patents #7 of 220Top 4%
UN Unknown: 3 patents #7,366 of 83,584Top 9%
KL Kla-Tencor: 2 patents #566 of 1,394Top 45%
SI Sensys Instruments: 2 patents #6 of 13Top 50%
FM F. J. Littell Machine: 2 patents #2 of 6Top 35%
HA Hughes Aircraft: 1 patents #1,260 of 2,963Top 45%
CE Clark Equipment: 1 patents #215 of 416Top 55%
📍 Livingston, TX: #1 of 77 inventorsTop 2%
🗺 Texas: #943 of 125,132 inventorsTop 1%
Overall (All Time): #29,350 of 4,157,543Top 1%
70
Patents All Time

Issued Patents All Time

Showing 1–25 of 70 patents

Patent #TitleCo-InventorsDate
11561476 UV lithography system 2023-01-24
11520235 EUV lithography system with diffraction optics 2022-12-06
10025079 Actinic, spot-scanning microscope for EUV mask inspection and metrology 2018-07-17
9651874 Scanned-spot-array DUV lithography system 2017-05-16
9618313 Methods for measuring distance 2017-04-11
9612370 EUV light source with spectral purity filter and power recycling 2017-04-04
9188874 Spot-array imaging system for maskless lithography and parallel confocal microscopy 2015-11-17
9182209 Methods for measuring distance 2015-11-10
9097983 Scanned-spot-array EUV lithography system 2015-08-04
8994920 Optical systems and methods for absorbance modulation 2015-03-31
8687277 Stacked-grating light modulator 2014-04-01
7333200 Overlay metrology method and apparatus using more than one grating per measurement direction Abdurrahman Sezginer 2008-02-19
7295315 Focus and alignment sensors and methods for use with scanning microlens-array printer 2007-11-13
7248362 Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor Adam E. Norton, Fred E. Stanke 2007-07-24
7230704 Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay Abdurrahman Sezginer, Hsu-Ting Huang 2007-06-12
7224450 Method and apparatus for position-dependent optical metrology calibration Abdurrahman Sezginer, Adam E. Norton, Holger Tuitje 2007-05-29
7215419 Method and apparatus for position-dependent optical metrology calibration Abdurrahman Sezginer, Adam E. Norton, Holger Tuitje 2007-05-08
7170604 Overlay metrology method and apparatus using more than one grating per measurement direction Abdurrahman Sezginer 2007-01-30
7158229 Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor Adam E. Norton, Fred E. Stanke 2007-01-02
7116405 Maskless, microlens EUV lithography system with grazing-incidence illumination optics 2006-10-03
7099081 Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor Adam E. Norton, Fred E. Stanke 2006-08-29
7095496 Method and apparatus for position-dependent optical metrology calibration Abdurrahman Sezginer, Adam E. Norton, Holger Tuitje 2006-08-22
7069182 Database interpolation method for optical measurement of diffractive microstructures Fred E. Stanke 2006-06-27
7069153 CD metrology method 2006-06-27
7049633 Method of measuring meso-scale structures on wafers Fred E. Stanke 2006-05-23