Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11270430 | Wafer inspection using difference images | Abdurrahman Sezginer, Xiaochun Li, Pavan Kumar, Junqing Huang, Lisheng Gao +2 more | 2022-03-08 |
| 10539512 | Block-to-block reticle inspection | Abdurrahman Sezginer, Patrick LoPresti, Joe Blecher, Rui-fang Shi, John Fielden | 2020-01-21 |
| 10451563 | Inspection of photomasks by comparing two photomasks | Weston L. Sousa, Carl Hess | 2019-10-22 |
| 9892503 | Monitoring changes in photomask defectivity | Chun Guan, Joseph M. Blecher, Robert A. Comstock, Mark J. Wihl | 2018-02-13 |
| 9778205 | Delta die and delta database inspection | Carl Hess, Yanwei Liu | 2017-10-03 |
| 9778207 | Integrated multi-pass inspection | Weston L. Sousa, Rui-fang Shi | 2017-10-03 |
| 9766185 | Block-to-block reticle inspection | Abdurrahman Sezginer, Patrick LoPresti, Joe Blecher, Rui-fang Shi, John Fielden | 2017-09-19 |
| 9518935 | Monitoring changes in photomask defectivity | Chun Guan, Joseph M. Blecher, Robert A. Comstock, Mark J. Wihl | 2016-12-13 |
| 8785082 | Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality | Stanley Stokowski | 2014-07-22 |
| 8611637 | Wafer plane detection of lithographically significant contamination photomask defects | Ruifang Shi | 2013-12-17 |
| 8204297 | Methods and systems for classifying defects detected on a reticle | Carl Hess | 2012-06-19 |
| 8151220 | Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data | Carl Hess | 2012-04-03 |
| 8090189 | Detection of thin line for selective sensitivity during reticle inspection | Vinayak Dattatreya Phalke, Ge Cong, Lih-Huah Yiin | 2012-01-03 |
| 7995199 | Method for detection of oversized sub-resolution assist features | Carl Hess | 2011-08-09 |
| 7995832 | Photomask inspection and verification by lithography image reconstruction using imaging pupil filters | Rui-fang Shi | 2011-08-09 |
| 7932004 | Feature identification for metrological analysis | Carl Hess | 2011-04-26 |
| 7873204 | Method for detecting lithographically significant defects on reticles | Mark J. Wihl, Lih-Huah Yiin | 2011-01-18 |
| 7738093 | Methods for detecting and classifying defects on a reticle | David Alles, Mark J. Wihl, Stan Stokowski, Damon F. Kvamme | 2010-06-15 |
| 7646906 | Computer-implemented methods for detecting defects in reticle design data | Zain Saidin, Lance Glasser, Carl Hess, Moshe E. Preil | 2010-01-12 |
| 7440093 | Apparatus and methods for providing selective defect sensitivity | Zain Saidin, Sterling Watson | 2008-10-21 |
| 7271891 | Apparatus and methods for providing selective defect sensitivity | Zain Saidin, Sterling Watson | 2007-09-18 |
| 6754379 | Aligning rectilinear images in 3D through projective registration and calibration | Ken Turkowski | 2004-06-22 |
| 6549651 | Aligning rectilinear images in 3D through projective registration and calibration | Ken Turkowski | 2003-04-15 |
| 6434265 | Aligning rectilinear images in 3D through projective registration and calibration | Ken Turkowski | 2002-08-13 |
| 6359617 | Blending arbitrary overlaying images into panoramas | — | 2002-03-19 |