Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8611637 | Wafer plane detection of lithographically significant contamination photomask defects | Yalin Xiong | 2013-12-17 |
| 8103086 | Reticle defect inspection with model-based thin line approaches | Xiaochun Li | 2012-01-24 |
| 7493590 | Process window optical proximity correction | Carl Hess, Gaurav Verma | 2009-02-17 |