| 10990019 |
Stochastic reticle defect dispositioning |
John Biafore, Alessandro Vaglio Pret |
2021-04-27 |
$205,045,000 |
| 10777377 |
Multi-column spacing for photomask and reticle inspection and wafer print check verification |
Robert Haynes, Frank Chilese |
2020-09-15 |
|
| 10474042 |
Stochastically-aware metrology and fabrication |
John Biafore |
2019-11-12 |
|
| 10262408 |
System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer |
Allen Park, Andrew Cross |
2019-04-16 |
|
| 9530662 |
Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control |
Azat Latypov, Tamer Coskun |
2016-12-27 |
$8,113,000 |
| 9508562 |
Sidewall image templates for directed self-assembly materials |
Ji Xu, Richard A. Farrell, Gerard Schmid |
2016-11-29 |
$4,439,000 |
| 9188974 |
Methods for improved monitor and control of lithography processes |
Chris Mack |
2015-11-17 |
|
| 8956808 |
Asymmetric templates for forming non-periodic patterns using directed self-assembly materials |
Gerard Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone |
2015-02-17 |
$2,156,000 |
| 8889343 |
Optimizing lithographic processes using laser annealing techniques |
Gerard Schmid, Richard A. Farrell, Ji Xu, Thomas I. Wallow |
2014-11-18 |
$1,887,000 |
| 8790522 |
Chemical and physical templates for forming patterns using directed self-assembly materials |
Gerard Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone |
2014-07-29 |
$2,012,000 |
| 8644588 |
Photo-mask and wafer image reconstruction |
Alex Hegyi, Daniel Abrams |
2014-02-04 |
|
| 8331645 |
Photo-mask and wafer image reconstruction |
Alex Hegyi, Daniel Abrams |
2012-12-11 |
|
| 8318391 |
Process window signature patterns for lithography process control |
Jun Ye, Xun Chen, Shauh-Teh Juang, James Wiley |
2012-11-27 |
$20,130,000 |
| 8280146 |
Photo-mask and wafer image reconstruction |
Alex Hegyi, Daniel Abrams |
2012-10-02 |
|
| 8260032 |
Photo-mask and wafer image reconstruction |
Alex Hegyi, Daniel Abrams |
2012-09-04 |
|
| 8208712 |
Photo-mask and wafer image reconstruction |
Alex Hegyi, Daniel Abrams |
2012-06-26 |
|
| 8204295 |
Photo-mask and wafer image reconstruction |
Alex Hegyi, Daniel Abrams |
2012-06-19 |
|
| 8200002 |
Photo-mask and wafer image reconstruction |
Alex Hegyi, Daniel Abrams |
2012-06-12 |
|
| 8057967 |
Process window signature patterns for lithography process control |
Jun Ye, Xun Chen, Shauh-Teh Juang, James Wiley |
2011-11-15 |
$7,965,000 |
| 7853920 |
Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing |
Jun Ye, James Wiley, Shauh-Teh Juang, Michael Gassner |
2010-12-14 |
$5,130,000 |
| 7804994 |
Overlay metrology and control method |
Michael Adel, Mark Ghinovker, Elyakim Kassel, Boris Golovanevsky, John Robinson +3 more |
2010-09-28 |
$12,129,000 |
| 7769225 |
Methods and systems for detecting defects in a reticle design pattern |
Sagar A. Kekare, Ingrid B. Peterson |
2010-08-03 |
$15,787,000 |
| 7749666 |
System and method for measuring and analyzing lithographic parameters and determining optimal process corrections |
Michael Gassner, Stefan Hunsche, Yu Cao, Jun Ye |
2010-07-06 |
$2,213,000 |
| 7695876 |
Method for identifying and using process window signature patterns for lithography process control |
Jun Ye, Xun Chen, Shauh-Teh Juang, James Wiley |
2010-04-13 |
|
| 7689966 |
Methods, systems, and carrier media for evaluating reticle layout data |
Gaurav Verma, Lance Glasser |
2010-03-30 |
$12,640,000 |
