Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10990019 | Stochastic reticle defect dispositioning | John Biafore, Alessandro Vaglio Pret | 2021-04-27 |
| 10777377 | Multi-column spacing for photomask and reticle inspection and wafer print check verification | Robert Haynes, Frank Chilese | 2020-09-15 |
| 10474042 | Stochastically-aware metrology and fabrication | John Biafore | 2019-11-12 |
| 10262408 | System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer | Allen Park, Andrew Cross | 2019-04-16 |
| 9530662 | Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control | Azat Latypov, Tamer Coskun | 2016-12-27 |
| 9508562 | Sidewall image templates for directed self-assembly materials | Ji Xu, Richard A. Farrell, Gerard Schmid | 2016-11-29 |
| 9188974 | Methods for improved monitor and control of lithography processes | Chris Mack | 2015-11-17 |
| 8956808 | Asymmetric templates for forming non-periodic patterns using directed self-assembly materials | Gerard Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone | 2015-02-17 |
| 8889343 | Optimizing lithographic processes using laser annealing techniques | Gerard Schmid, Richard A. Farrell, Ji Xu, Thomas I. Wallow | 2014-11-18 |
| 8790522 | Chemical and physical templates for forming patterns using directed self-assembly materials | Gerard Schmid, Richad A. Farrell, Ji Xu, Jason R. Cantone | 2014-07-29 |
| 8644588 | Photo-mask and wafer image reconstruction | Alex Hegyi, Daniel Abrams | 2014-02-04 |
| 8331645 | Photo-mask and wafer image reconstruction | Alex Hegyi, Daniel Abrams | 2012-12-11 |
| 8318391 | Process window signature patterns for lithography process control | Jun Ye, Xun Chen, Shauh-Teh Juang, James Wiley | 2012-11-27 |
| 8280146 | Photo-mask and wafer image reconstruction | Alex Hegyi, Daniel Abrams | 2012-10-02 |
| 8260032 | Photo-mask and wafer image reconstruction | Alex Hegyi, Daniel Abrams | 2012-09-04 |
| 8208712 | Photo-mask and wafer image reconstruction | Alex Hegyi, Daniel Abrams | 2012-06-26 |
| 8204295 | Photo-mask and wafer image reconstruction | Alex Hegyi, Daniel Abrams | 2012-06-19 |
| 8200002 | Photo-mask and wafer image reconstruction | Alex Hegyi, Daniel Abrams | 2012-06-12 |
| 8057967 | Process window signature patterns for lithography process control | Jun Ye, Xun Chen, Shauh-Teh Juang, James Wiley | 2011-11-15 |
| 7853920 | Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing | Jun Ye, James Wiley, Shauh-Teh Juang, Michael Gassner | 2010-12-14 |
| 7804994 | Overlay metrology and control method | Michael Adel, Mark Ghinovker, Elyakim Kassel, Boris Golovanevsky, John Robinson +3 more | 2010-09-28 |
| 7769225 | Methods and systems for detecting defects in a reticle design pattern | Sagar A. Kekare, Ingrid B. Peterson | 2010-08-03 |
| 7749666 | System and method for measuring and analyzing lithographic parameters and determining optimal process corrections | Michael Gassner, Stefan Hunsche, Yu Cao, Jun Ye | 2010-07-06 |
| 7695876 | Method for identifying and using process window signature patterns for lithography process control | Jun Ye, Xun Chen, Shauh-Teh Juang, James Wiley | 2010-04-13 |
| 7689966 | Methods, systems, and carrier media for evaluating reticle layout data | Gaurav Verma, Lance Glasser | 2010-03-30 |