| 12235224 |
Process window qualification modulation layouts |
Kaushik Sah, Martin Plihal |
2025-02-25 |
| 12066763 |
Sensitivity improvement of optical and SEM defection inspection |
Kaushik Sah, Sandip Halder, Sayantan Das |
2024-08-20 |
| 11092893 |
Inspection sensitivity improvements for optical and electron beam inspection |
Roel Gronheid |
2021-08-17 |
| 10957608 |
Guided scanning electron microscopy metrology based on wafer topography |
Arpit Yati, Shivam Agarwal, Jagdish Chandra Saraswatula |
2021-03-23 |
| 10818001 |
Using stochastic failure metrics in semiconductor manufacturing |
Wing-Shan Ribi Leung, Kaushik Sah, Allen Park |
2020-10-27 |
| 10699926 |
Identifying nuisances and defects of interest in defects detected on a wafer |
Martin Plihal, Brian Duffy, Mike VonDenHoff, Kaushik Sah, Antonio Mani |
2020-06-30 |
| 10598617 |
Metrology guided inspection sample shaping of optical inspection results |
Kaushik Sah, Antonio Mani |
2020-03-24 |
| 10262408 |
System, method and computer program product for systematic and stochastic characterization of pattern defects identified from a semiconductor wafer |
Allen Park, Moshe E. Preil |
2019-04-16 |
| 10262831 |
Method and system for weak pattern quantification |
Allen Park |
2019-04-16 |
| 10068323 |
Aware system, method and computer program product for detecting overlay-related defects in multi-patterned fabricated devices |
Kaushik Sah |
2018-09-04 |