Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
DA

Daniel Abrams — 26 Patents

LTLuminescent Technologies: 24 patents #1 of 23Top 5%
MIT: 1 patents #4,386 of 9,367Top 50%
Cambridge, MA: #358 of 8,183 inventorsTop 5%
Massachusetts: #3,939 of 88,656 inventorsTop 5%
Overall (All Time): #150,017 of 4,157,543Top 4%
26 Patents All Time
Daniel Abrams has been granted 26 US patents while listed as an inventor at Luminescent Technologies. The first was granted in 2000 and the most recent in February 2014. Daniel Abrams ranks #150,017 of 4,157,543 US inventors in our database (top 3.6%). Patent records list Daniel Abrams in Cambridge, MA, US.

Patents per Year

Patents granted per year, 2000 to 2014Bar chart with a peak of 8 patents in 2012.peak 82000: 1 patents20002006: 1 patents20062007: 1 patents20072008: 1 patents20082009: 2 patents20092010: 7 patents20102011: 4 patents20112012: 8 patents20122014: 1 patents2014

Issued Patents All Time

Showing 1–25 of 26 patents

Patent #TitleCo-InventorsDate
8644588 Photo-mask and wafer image reconstruction Moshe E. Preil, Alex Hegyi 2014-02-04
8331645 Photo-mask and wafer image reconstruction Moshe E. Preil, Alex Hegyi 2012-12-11
8280146 Photo-mask and wafer image reconstruction Moshe E. Preil, Alex Hegyi 2012-10-02
8260032 Photo-mask and wafer image reconstruction Moshe E. Preil, Alex Hegyi 2012-09-04
8245162 Write-pattern determination for maskless lithography Timothy Lin 2012-08-14
8208712 Photo-mask and wafer image reconstruction Moshe E. Preil, Alex Hegyi 2012-06-26
8204295 Photo-mask and wafer image reconstruction Moshe E. Preil, Alex Hegyi 2012-06-19
8200002 Photo-mask and wafer image reconstruction Moshe E. Preil, Alex Hegyi 2012-06-12
8111380 Write-pattern determination for maskless lithography Timothy Lin 2012-02-07
8056021 Method for time-evolving rectilinear contours representing photo masks Danping Peng, Stanley Osher 2011-11-08
7992109 Method for time-evolving rectilinear contours representing photo masks Danping Peng, Stanley Osher 2011-08-02
7984391 Method for time-evolving rectilinear contours representing photo masks Danping Peng, Stanley Osher 2011-07-19
7921385 Mask-pattern determination using topology types Christopher J. Ashton 2011-04-05
7793253 Mask-patterns including intentional breaks Danping Peng, Yong Liu, Paul Rissman 2010-09-07
7788627 Lithography verification using guard bands Christopher J. Ashton 2010-08-31
7757201 Method for time-evolving rectilinear contours representing photo masks Danping Peng, Stanley Osher 2010-07-13
7707541 Systems, masks, and methods for photolithography Stanley Osher, Danping Peng 2010-04-27
7703049 System, masks, and methods for photomasks optimized with approximate and accurate merit functions Danping Peng 2010-04-20
7703068 Technique for determining a mask pattern corresponding to a photo-mask Danping Peng, Stanley Osher 2010-04-20
7698665 Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern David Irby 2010-04-13
7571423 Optimized photomasks for photolithography Danping Peng, Stanley Osher 2009-08-04
7480889 Optimized photomasks for photolithography Danping Peng 2009-01-20
7441227 Method for time-evolving rectilinear contours representing photo masks Danping Peng, Stanley Osher 2008-10-21
7178127 Method for time-evolving rectilinear contours representing photo masks Danping Peng, Stanley Osher 2007-02-13
7124394 Method for time-evolving rectilinear contours representing photo masks Danping Peng, Stanley Osher 2006-10-17