Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429761 | Mura reduction method | Chi-Ming Tsai | 2025-09-30 |
| 12248254 | Universal metrology file, protocol, and process for maskless lithography systems | Tamer Coskun, Jang Fung Chen | 2025-03-11 |
| 8910091 | Method, program product and apparatus for performing double exposure lithography | Jang Fung Chen, Duan-Fu Stephen Hsu | 2014-12-09 |
| 8632930 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Sangbong Park, Jang Fung Chen | 2014-01-21 |
| 8495529 | Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography | Jang Fung Chen | 2013-07-23 |
| 8391605 | Method and apparatus for performing model-based OPC for pattern decomposed features | Duan-Fu Stephen Hsu, Jung Chul Park, Jang Fung Chen | 2013-03-05 |
| 8132130 | Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process | Jang Fung Chen, Duan-Fu Stephen Hsu, Thomas Laidig | 2012-03-06 |
| 8122391 | Method, program product and apparatus for performing double exposure lithography | Jang Fung Chen, Duan-Fu Stephen Hsu | 2012-02-21 |
| 8111921 | Method and apparatus for performing model-based OPC for pattern decomposed features | Duan-Fu Stephen Hsu, Jung Chul Park, Jang Fung Chen | 2012-02-07 |
| 8040573 | Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration | Xuelong Shi, Jang Fung Chen | 2011-10-18 |
| 8039180 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Jang Fung Chen | 2011-10-18 |
| 7998355 | CPL mask and a method and program product for generating the same | Kurt E. Wampler, Jang Fung Chen | 2011-08-16 |
| 7981576 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Sangbong Park, Jang Fung Chen | 2011-07-19 |
| 7892707 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Jang Fung Chen | 2011-02-22 |
| 7892703 | CPL mask and a method and program product for generating the same | Jang Fung Chen, Duan-Fu Stephen Hsu, Jung Chul Park, Thomas Laidig | 2011-02-22 |
| 7824826 | Method and apparatus for performing dark field double dipole lithography (DDL) | Duan-Fu Stephen Hsu, Sangbong Park, Jang Fung Chen | 2010-11-02 |
| 7681171 | Method, program product and apparatus for performing double exposure lithography | Jang Fung Chen, Duan-Fu Stephen Hsu | 2010-03-16 |
| 7620930 | Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography | Jang Fung Chen | 2009-11-17 |
| 7617476 | Method for performing pattern pitch-split decomposition utilizing anchoring features | Duan-Fu Stephen Hsu, Noel Corcoran, Jang Fung Chen | 2009-11-10 |
| 7614034 | Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology | Sangbong Park, Chung-Wei Hsu, Jang Fung Chen | 2009-11-03 |
| 7604909 | Method for improved manufacturability and patterning of sub-wavelength contact hole mask | Chung-Wei Hsu, Jang Fung Chen | 2009-10-20 |
| 7550235 | Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography | Xuelong Shi, Jang Fung Chen, Thomas Laidig, Kurt E. Wampler | 2009-06-23 |
| 7523438 | Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM | Michael S. Hsu, Stephen Hsu, Thomas Laidig, Jang Fung Chen | 2009-04-21 |
| 7514183 | Method for performing transmission tuning of a mask pattern to improve process latitude | Stephen Hsu, Jang Fung Chen, Xuelong Shi | 2009-04-07 |
| 7485396 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Kurt E. Wampler, Jang Fung Chen | 2009-02-03 |