Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11022894 | Rule-based deployment of assist features | Duan-Fu Stephen Hsu | 2021-06-01 |
| 10331039 | Rule-based deployment of assist features | Duan-Fu Stephen Hsu | 2019-06-25 |
| 8039180 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen | 2011-10-18 |
| 7998355 | CPL mask and a method and program product for generating the same | Douglas Van Den Broeke, Jang Fung Chen | 2011-08-16 |
| 7985515 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Duan-Fu Stephen Hsu, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran | 2011-07-26 |
| 7892707 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen | 2011-02-22 |
| 7820341 | Method of two dimensional feature model calibration and optimization | Thomas Laidig, Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach | 2010-10-26 |
| 7774736 | Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography | Douglas Broeke, Jang Fung Chen, Thomas Laidig, Stephen Hsu | 2010-08-10 |
| 7666554 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Duan-Fu Stephen Hsu, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran | 2010-02-23 |
| 7550235 | Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography | Xuelong Shi, Jang Fung Chen, Thomas Laidig, Douglas Van Den Broeke | 2009-06-23 |
| 7549140 | Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography | Doug Van Den Broeke, Jang Fung Chen, Thomas Laidig, Stephen Hsu | 2009-06-16 |
| 7485396 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen | 2009-02-03 |
| 7434195 | Method for performing full-chip manufacturing reliability checking and correction | Michael S. Hsu, Thomas Laidig, Duan-Fu Stephen Hsu, Xuelong Shi | 2008-10-07 |
| 7376930 | Method, program product and apparatus for generating assist features utilizing an image field map | Douglas Van Den Broeke, Uwe Hollerbach, Xuelong Shi, Jang Fung Chen | 2008-05-20 |
| 7354681 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen | 2008-04-08 |
| 7247574 | Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography | Douglas Broeke, Jang Fung Chen, Thomas Laidig, Stephen Hsu | 2007-07-24 |
| 7175940 | Method of two dimensional feature model calibration and optimization | Thomas Laidig, Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach | 2007-02-13 |
| 7138212 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Duan-Fu Stephen Hsu, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran | 2006-11-21 |
| 6851103 | Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography | Doug Van Den Broeke, Jang Fung Chen, Thomas Laidig, Stephen Hsu | 2005-02-01 |
| 6835510 | Hybrid phase-shift mask | Jang Fung Chen, Roger Caldwell, Thomas Laidig | 2004-12-28 |
| 6670081 | Optical proximity correction method utilizing serifs having variable dimensions | Thomas Laidig | 2003-12-30 |
| 6623895 | Hybrid phase-shift mask | Jang Fung Chen, Roger Caldwell, Thomas Laidig | 2003-09-23 |
| 6482555 | Method of patterning sub-0.25&lgr; line features with high transmission, “attenuated” phase shift masks | J. Fung Chen, Roger Caldwell, Tom Laidig | 2002-11-19 |
| 6312854 | "Method of patterning sub-0.25 lambda line features with high transmission, ""attenuated"" phase shift masks" | J. Fung Chen, Roger Caldwell, Tom Laidig | 2001-11-06 |
| 6114071 | Method of fine feature edge tuning with optically-halftoned mask | J. Fung Chen, Tom Laidig | 2000-09-05 |