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Kurt E. Wampler — 27 Patents

ABAsml Masktools B.V.: 18 patents #5 of 37Top 15%
ABAsml Masktools Netherlands B.V.: 5 patents #1 of 9Top 15%
Asml Netherlands B.V.: 2 patents #1,484 of 3,192Top 50%
MEMicrounity Systems Engineering: 2 patents #14 of 31Top 50%
Sunnyvale, CA: #881 of 14,302 inventorsTop 7%
California: #19,967 of 386,348 inventorsTop 6%
Overall (All Time): #142,059 of 4,157,543Top 4%
27 Patents All Time
Kurt E. Wampler has been granted 27 US patents while listed as an inventor at Asml Masktools B.V.. The first was granted in 1997 and the most recent in June 2021. Kurt E. Wampler ranks #142,059 of 4,157,543 US inventors in our database (top 3.4%). Patent records list Kurt E. Wampler in Sunnyvale, CA, US.

Issued Patents All Time

Showing 1–25 of 27 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
11022894 Rule-based deployment of assist features Duan-Fu Stephen Hsu 2021-06-01 $41,772,000
10331039 Rule-based deployment of assist features Duan-Fu Stephen Hsu 2019-06-25 $11,730,000
8039180 Scattering bar OPC application method for sub-half wavelength lithography patterning Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen 2011-10-18
7998355 CPL mask and a method and program product for generating the same Douglas Van Den Broeke, Jang Fung Chen 2011-08-16
7985515 Method and apparatus for performing model-based layout conversion for use with dipole illumination Duan-Fu Stephen Hsu, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran 2011-07-26
7892707 Scattering bar OPC application method for sub-half wavelength lithography patterning Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen 2011-02-22
7820341 Method of two dimensional feature model calibration and optimization Thomas Laidig, Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach 2010-10-26
7774736 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Douglas Broeke, Jang Fung Chen, Thomas Laidig, Stephen Hsu 2010-08-10
7666554 Method and apparatus for performing model-based layout conversion for use with dipole illumination Duan-Fu Stephen Hsu, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran 2010-02-23
7550235 Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography Xuelong Shi, Jang Fung Chen, Thomas Laidig, Douglas Van Den Broeke 2009-06-23
7549140 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography Doug Van Den Broeke, Jang Fung Chen, Thomas Laidig, Stephen Hsu 2009-06-16
7485396 Scattering bar OPC application method for sub-half wavelength lithography patterning Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen 2009-02-03
7434195 Method for performing full-chip manufacturing reliability checking and correction Michael S. Hsu, Thomas Laidig, Duan-Fu Stephen Hsu, Xuelong Shi 2008-10-07
7376930 Method, program product and apparatus for generating assist features utilizing an image field map Douglas Van Den Broeke, Uwe Hollerbach, Xuelong Shi, Jang Fung Chen 2008-05-20
7354681 Scattering bar OPC application method for sub-half wavelength lithography patterning Thomas Laidig, Douglas Van Den Broeke, Jang Fung Chen 2008-04-08
7247574 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Douglas Broeke, Jang Fung Chen, Thomas Laidig, Stephen Hsu 2007-07-24
7175940 Method of two dimensional feature model calibration and optimization Thomas Laidig, Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach 2007-02-13
7138212 Method and apparatus for performing model-based layout conversion for use with dipole illumination Duan-Fu Stephen Hsu, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran 2006-11-21
6851103 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography Doug Van Den Broeke, Jang Fung Chen, Thomas Laidig, Stephen Hsu 2005-02-01
6835510 Hybrid phase-shift mask Jang Fung Chen, Roger Caldwell, Thomas Laidig 2004-12-28
6670081 Optical proximity correction method utilizing serifs having variable dimensions Thomas Laidig 2003-12-30
6623895 Hybrid phase-shift mask Jang Fung Chen, Roger Caldwell, Thomas Laidig 2003-09-23
6482555 Method of patterning sub-0.25&lgr; line features with high transmission, “attenuated” phase shift masks J. Fung Chen, Roger Caldwell, Tom Laidig 2002-11-19
6312854 "Method of patterning sub-0.25 lambda line features with high transmission, ""attenuated"" phase shift masks" J. Fung Chen, Roger Caldwell, Tom Laidig 2001-11-06
6114071 Method of fine feature edge tuning with optically-halftoned mask J. Fung Chen, Tom Laidig 2000-09-05

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