Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography

US Patent 7774736 · Granted Aug 10, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Package imaging for die location correction in digital lithography2025
Controlling light source wavelengths for selectable phase shifts between pixels 2025
Dynamic generation of layout adaptive packaging2025
Optimization of a digital pattern file for a digital lithography device2025
Universal metrology file, protocol, and process for maskless lithography systems2025
Overlaying on locally dispositioned patterns by ML based dynamic digital correct2025
Digital lithography scan sequencing2025
Use of adaptive replacement maps in digital lithography for local cell replaceme2024
Image stabilization for digital lithography2024
Multi-tone scheme for maskless lithography2024
Advanced-packaging high-volume-mode digital-lithography-tool2024
Maskless based lithography methods2024