Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7774736 | Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography | Jang Fung Chen, Thomas Laidig, Kurt E. Wampler, Stephen Hsu | 2010-08-10 |
| 7594199 | Method of optical proximity correction design for contact hole mask | Robert John Socha, Xuelong Shi, Jang Fung Chen | 2009-09-22 |
| 7506299 | Feature optimization using interference mapping lithography | Robert John Socha, Xuelong Shi, Jang Fung Chen | 2009-03-17 |
| 7399559 | Optical proximity correction method utilizing phase-edges as sub-resolution assist features | J. Fung Chen | 2008-07-15 |
| 7247574 | Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography | Jang Fung Chen, Thomas Laidig, Kurt E. Wampler, Stephen Hsu | 2007-07-24 |