Issued Patents All Time
Showing 25 most recent of 82 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12372779 | Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems | Christopher Dennis Bencher, Hwan J. Jeong, Uwe Hollerbach | 2025-07-29 |
| 12360467 | Dynamic generation of layout adaptive packaging | Uwe Hollerbach | 2025-07-15 |
| 12302641 | Optimization of a digital pattern file for a digital lithography device | Chung-Shin Kang, Yinfeng Dong, Yao Cheng Yang, Chen-Chien Hung, Shivaraj Gururaj Kamalapura +1 more | 2025-05-13 |
| 12242789 | Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC) | Tamer Coskun, Aidyn Kemeldinov, Chung-Shin Kang, Uwe Hollerbach | 2025-03-04 |
| 12189299 | Digital lithography scan sequencing | Ying-Chiao Wang, Chun-Chih Chuang, Frederick Lie, Chen-Yuan Hsieh, Chun-Cheng Yeh | 2025-01-07 |
| 12141517 | Use of adaptive replacement maps in digital lithography for local cell replacement | Aravind Inumpudi | 2024-11-12 |
| 12117732 | Image stabilization for digital lithography | Christopher Dennis Bencher | 2024-10-15 |
| 12105424 | Multi-tone scheme for maskless lithography | Christopher Dennis Bencher, Joseph R. Johnson | 2024-10-01 |
| 11934762 | Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC) | Tamer Coskun, Aidyn Kemeldinov, Chung-Shin Kang, Uwe Hollerbach | 2024-03-19 |
| 11899379 | Dynamic generation of layout adaptive packaging | Uwe Hollerbach | 2024-02-13 |
| 11899198 | Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems | Christopher Dennis Bencher, Hwan J. Jeong, Uwe Hollerbach | 2024-02-13 |
| 11868700 | Use of adaptive replacement maps in digital lithography for local cell replacement | Aravind Inumpudi | 2024-01-09 |
| 11599032 | Dynamic generation of layout adaptive packaging | Uwe Hollerbach | 2023-03-07 |
| 10983441 | Resolution enhanced digital lithography with anti-blazed DMD | Hwan J. Jeong | 2021-04-20 |
| 10935892 | Freeform distortion correction | Tamer Coskun, Jang Fung Chen | 2021-03-02 |
| 10935890 | Half tone scheme for maskless lithography | Christopher Dennis Bencher, Joseph R. Johnson | 2021-03-02 |
| 10921714 | Reserving spatial light modulator sections to address field non-uniformities | Joseph R. Johnson, Christopher Dennis Bencher | 2021-02-16 |
| 10705433 | Reserving spatial light modulator sections to address field non-uniformities | Joseph R. Johnson, Christopher Dennis Bencher | 2020-07-07 |
| 10678150 | Dynamic generation of layout adaptive packaging | Uwe Hollerbach | 2020-06-09 |
| 10591815 | Shifting of patterns to reduce line waviness | Joseph R. Johnson, Christopher Dennis Bencher | 2020-03-17 |
| 10571809 | Half tone scheme for maskless lithography | Christopher Dennis Bencher, Joseph R. Johnson | 2020-02-25 |
| 10503076 | Reserving spatial light modulator sections to address field non-uniformities | Joseph R. Johnson, Christopher Dennis Bencher | 2019-12-10 |
| 10495979 | Half tone scheme for maskless lithography | Christopher Dennis Bencher, Joseph R. Johnson | 2019-12-03 |
| 10495975 | Line edge roughness reduction via step size alteration | Joseph R. Johnson, Christopher Dennis Bencher | 2019-12-03 |
| 10488762 | Method to reduce data stream for spatial light modulator | Joseph R. Johnson, Christopher Dennis Bencher | 2019-11-26 |