| 12372779 |
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems |
Christopher Dennis Bencher, Hwan J. Jeong, Uwe Hollerbach |
2025-07-29 |
|
| 12360467 |
Dynamic generation of layout adaptive packaging |
Uwe Hollerbach |
2025-07-15 |
|
| 12302641 |
Optimization of a digital pattern file for a digital lithography device |
Chung-Shin Kang, Yinfeng Dong, Yao Cheng Yang, Chen-Chien Hung, Shivaraj Gururaj Kamalapura +1 more |
2025-05-13 |
|
| 12242789 |
Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC) |
Tamer Coskun, Aidyn Kemeldinov, Chung-Shin Kang, Uwe Hollerbach |
2025-03-04 |
|
| 12189299 |
Digital lithography scan sequencing |
Ying-Chiao Wang, Chun-Chih Chuang, Frederick Lie, Chen-Yuan Hsieh, Chun-Cheng Yeh |
2025-01-07 |
|
| 12141517 |
Use of adaptive replacement maps in digital lithography for local cell replacement |
Aravind Inumpudi |
2024-11-12 |
$39,712,000 |
| 12117732 |
Image stabilization for digital lithography |
Christopher Dennis Bencher |
2024-10-15 |
$93,354,000 |
| 12105424 |
Multi-tone scheme for maskless lithography |
Christopher Dennis Bencher, Joseph R. Johnson |
2024-10-01 |
$68,865,000 |
| 11934762 |
Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC) |
Tamer Coskun, Aidyn Kemeldinov, Chung-Shin Kang, Uwe Hollerbach |
2024-03-19 |
$54,086,000 |
| 11899198 |
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems |
Christopher Dennis Bencher, Hwan J. Jeong, Uwe Hollerbach |
2024-02-13 |
$47,589,000 |
| 11899379 |
Dynamic generation of layout adaptive packaging |
Uwe Hollerbach |
2024-02-13 |
$47,589,000 |
| 11868700 |
Use of adaptive replacement maps in digital lithography for local cell replacement |
Aravind Inumpudi |
2024-01-09 |
$49,156,000 |
| 11599032 |
Dynamic generation of layout adaptive packaging |
Uwe Hollerbach |
2023-03-07 |
$32,704,000 |
| 10983441 |
Resolution enhanced digital lithography with anti-blazed DMD |
Hwan J. Jeong |
2021-04-20 |
$98,122,000 |
| 10935890 |
Half tone scheme for maskless lithography |
Christopher Dennis Bencher, Joseph R. Johnson |
2021-03-02 |
$62,769,000 |
| 10935892 |
Freeform distortion correction |
Tamer Coskun, Jang Fung Chen |
2021-03-02 |
$62,769,000 |
| 10921714 |
Reserving spatial light modulator sections to address field non-uniformities |
Joseph R. Johnson, Christopher Dennis Bencher |
2021-02-16 |
$36,444,000 |
| 10705433 |
Reserving spatial light modulator sections to address field non-uniformities |
Joseph R. Johnson, Christopher Dennis Bencher |
2020-07-07 |
$29,619,000 |
| 10678150 |
Dynamic generation of layout adaptive packaging |
Uwe Hollerbach |
2020-06-09 |
$53,212,000 |
| 10591815 |
Shifting of patterns to reduce line waviness |
Joseph R. Johnson, Christopher Dennis Bencher |
2020-03-17 |
$17,260,000 |
| 10571809 |
Half tone scheme for maskless lithography |
Christopher Dennis Bencher, Joseph R. Johnson |
2020-02-25 |
$22,337,000 |
| 10503076 |
Reserving spatial light modulator sections to address field non-uniformities |
Joseph R. Johnson, Christopher Dennis Bencher |
2019-12-10 |
$14,920,000 |
| 10495979 |
Half tone scheme for maskless lithography |
Christopher Dennis Bencher, Joseph R. Johnson |
2019-12-03 |
$22,017,000 |
| 10495975 |
Line edge roughness reduction via step size alteration |
Joseph R. Johnson, Christopher Dennis Bencher |
2019-12-03 |
$22,017,000 |
| 10488762 |
Method to reduce data stream for spatial light modulator |
Joseph R. Johnson, Christopher Dennis Bencher |
2019-11-26 |
$24,423,000 |
