TL

Thomas Laidig

Applied Materials: 49 patents #164 of 7,310Top 3%
AB Asml Masktools B.V.: 21 patents #3 of 37Top 9%
ME Microunity Systems Engineering: 3 patents #10 of 31Top 35%
AB Asml Masktools Netherlands B.V.: 2 patents #7 of 9Top 80%
🗺 California: #3,255 of 386,348 inventorsTop 1%
Overall (All Time): #21,276 of 4,157,543Top 1%
82
Patents All Time

Issued Patents All Time

Showing 51–75 of 82 patents

Patent #TitleCo-InventorsDate
8670106 Optical imaging writer system Jang Fung Chen 2014-03-11
8395752 Optical imaging writer system 2013-03-12
8390781 Optical imaging writer system 2013-03-05
8390786 Optical imaging writer system 2013-03-05
8253923 Optical imaging writer system Jang Fung Chen 2012-08-28
8132130 Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke 2012-03-06
8039180 Scattering bar OPC application method for sub-half wavelength lithography patterning Kurt E. Wampler, Douglas Van Den Broeke, Jang Fung Chen 2011-10-18
7892707 Scattering bar OPC application method for sub-half wavelength lithography patterning Kurt E. Wampler, Douglas Van Den Broeke, Jang Fung Chen 2011-02-22
7892703 CPL mask and a method and program product for generating the same Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Jung Chul Park 2011-02-22
7856606 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems Markus Franciscus Antonius Eurlings, Melchior Mulder, Uwe Hollerbach 2010-12-21
7820341 Method of two dimensional feature model calibration and optimization Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler 2010-10-26
7774736 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Douglas Broeke, Jang Fung Chen, Kurt E. Wampler, Stephen Hsu 2010-08-10
7550235 Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography Xuelong Shi, Jang Fung Chen, Kurt E. Wampler, Douglas Van Den Broeke 2009-06-23
7549140 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography Doug Van Den Broeke, Jang Fung Chen, Kurt E. Wampler, Stephen Hsu 2009-06-16
7523438 Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM Michael S. Hsu, Stephen Hsu, Douglas Van Den Broeke, Jang Fung Chen 2009-04-21
7485396 Scattering bar OPC application method for sub-half wavelength lithography patterning Kurt E. Wampler, Douglas Van Den Broeke, Jang Fung Chen 2009-02-03
7434195 Method for performing full-chip manufacturing reliability checking and correction Michael S. Hsu, Kurt E. Wampler, Duan-Fu Stephen Hsu, Xuelong Shi 2008-10-07
7398508 Eigen decomposition based OPC model Xuelong Shi, Robert John Socha, Douglas Van Den Broeke 2008-07-08
7354681 Scattering bar OPC application method for sub-half wavelength lithography patterning Kurt E. Wampler, Douglas Van Den Broeke, Jang Fung Chen 2008-04-08
7355681 Optical proximity correction using chamfers and rounding at corners Markus Franciscus Antonius Eurlings 2008-04-08
7349066 Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence Markus Franciscus Antonius Eurlings, Uwe Hollerbach 2008-03-25
7247574 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Douglas Broeke, Jang Fung Chen, Kurt E. Wampler, Stephen Hsu 2007-07-24
7231629 Feature optimization using enhanced interference mapping lithography 2007-06-12
7175940 Method of two dimensional feature model calibration and optimization Jang Fung Chen, Xuelong Shi, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler 2007-02-13
6951701 Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM Michael S. Hsu, Stephen Hsu, Douglas Van Den Broeke, Jang Fung Chen 2005-10-04