Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8040573 | Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration | Jang Fung Chen, Douglas Van Den Broeke | 2011-10-18 |
| 7820341 | Method of two dimensional feature model calibration and optimization | Thomas Laidig, Jang Fung Chen, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler | 2010-10-26 |
| 7735052 | Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs | Jang Fung Chen, Duan-Fu Stephen Hsu | 2010-06-08 |
| 7594199 | Method of optical proximity correction design for contact hole mask | Robert John Socha, Douglas Broeke, Jang Fung Chen | 2009-09-22 |
| 7550235 | Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography | Jang Fung Chen, Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke | 2009-06-23 |
| 7514183 | Method for performing transmission tuning of a mask pattern to improve process latitude | Stephen Hsu, Jang Fung Chen, Douglas Van Den Broeke | 2009-04-07 |
| 7506299 | Feature optimization using interference mapping lithography | Robert John Socha, Douglas Broeke, Jang Fung Chen | 2009-03-17 |
| 7440082 | Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model | Jang Fung Chen | 2008-10-21 |
| 7434195 | Method for performing full-chip manufacturing reliability checking and correction | Michael S. Hsu, Thomas Laidig, Kurt E. Wampler, Duan-Fu Stephen Hsu | 2008-10-07 |
| 7398508 | Eigen decomposition based OPC model | Robert John Socha, Thomas Laidig, Douglas Van Den Broeke | 2008-07-08 |
| 7376930 | Method, program product and apparatus for generating assist features utilizing an image field map | Kurt E. Wampler, Douglas Van Den Broeke, Uwe Hollerbach, Jang Fung Chen | 2008-05-20 |
| 7342646 | Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model | Jang Fung Chen | 2008-03-11 |
| 7242459 | Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model | Jang Fung Chen | 2007-07-10 |
| 7175940 | Method of two dimensional feature model calibration and optimization | Thomas Laidig, Jang Fung Chen, Ralph Schlief, Uwe Hollerbach, Kurt E. Wampler | 2007-02-13 |
| 7124395 | Automatic optical proximity correction (OPC) rule generation | Jang Fung Chen | 2006-10-17 |
| 7100145 | Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs | Jang Fung Chen, Duan-Fu Stephen Hsu | 2006-08-29 |
| 6792591 | Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs | Jang Fung Chen, Duan-Fu Stephen Hsu | 2004-09-14 |
| 6519760 | Method and apparatus for minimizing optical proximity effects | Jang Fung Chen, Stephen Hsu | 2003-02-11 |
| 6245491 | Photo-assisted post exposure bake for chemically amplified photoresist process | — | 2001-06-12 |
| 6100012 | Infra-red radiation post-exposure bake process for chemically amplified resist lithography | — | 2000-08-08 |