Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12422743 | Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method | Renzo Capelli, Markus Koch, Walter Pauls, Grizelda Kersteen, Klaus Gwosch | 2025-09-23 |
| 12353141 | Method for heating an optical element in a microlithographic projection exposure apparatus and optical system | — | 2025-07-08 |
| 11460785 | Method for the qualification of a mask for microlithography | — | 2022-10-04 |
| 11256178 | Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method | — | 2022-02-22 |
| 11061331 | Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth | Markus Koch, Renzo Capelli, Martin Dietzel | 2021-07-13 |
| 10948637 | Metrology system having an EUV optical unit | Stefan Mueller, Ralf Gehrke | 2021-03-16 |
| 10775691 | Method for examining photolithographic masks and mask metrology apparatus for performing the method | Markus Koch, Renzo Capelli | 2020-09-15 |
| 10761420 | Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method | — | 2020-09-01 |
| 10564551 | Method for determining a focus position of a lithography mask and metrology system for carrying out such a method | Markus Koch, Renzo Capelli, Martin Dietzel | 2020-02-18 |
| 10481505 | Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks | Markus Koch, Renzo Capelli, Martin Dietzel | 2019-11-19 |
| 9915871 | Method for measuring an angularly resolved intensity distribution and projection exposure apparatus | Wolfgang Emer | 2018-03-13 |
| 9785052 | Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors | Johannes Ruoff, Jens Timo Neumann, Joerg Zimmermann, Dirk Juergens | 2017-10-10 |
| 9081294 | Method for measuring an angularly resolved intensity distribution and projection exposure apparatus | Wolfgang Emer | 2015-07-14 |
| 8659745 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering +7 more | 2014-02-25 |
| 8542346 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering +7 more | 2013-09-24 |
| 8325322 | Optical correction device | Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil +7 more | 2012-12-04 |