RC

Renzo Capelli

CG Carl Zeiss Smt Gmbh: 12 patents #117 of 1,189Top 10%
📍 Heidenheim, DE: #33 of 442 inventorsTop 8%
Overall (All Time): #396,517 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12422743 Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method Markus Koch, Dirk Hellweg, Walter Pauls, Grizelda Kersteen, Klaus Gwosch 2025-09-23
12372431 Method for determining an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured Markus Koch, Klaus Gwosch, Dmitry Simakov 2025-07-29
12288272 Method for determining a production aerial image of an object to be measured Martin Dietzel 2025-04-29
12174546 Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography mask Walter Pauls 2024-12-24
11796926 Metrology system for examining objects with EUV measurement light Klaus Gwosch 2023-10-24
11774848 Method and apparatus for repairing defects of a photolithographic mask for the EUV range Hendrik Steigerwald 2023-10-03
11079673 Method and apparatus for repairing defects of a photolithographic mask for the EUV range Hendrik Steigerwald 2021-08-03
11061331 Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth Markus Koch, Dirk Hellweg, Martin Dietzel 2021-07-13
10775691 Method for examining photolithographic masks and mask metrology apparatus for performing the method Dirk Hellweg, Markus Koch 2020-09-15
10564551 Method for determining a focus position of a lithography mask and metrology system for carrying out such a method Markus Koch, Dirk Hellweg, Martin Dietzel 2020-02-18
10481505 Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks Markus Koch, Dirk Hellweg, Martin Dietzel 2019-11-19
10055833 Method and system for EUV mask blank buried defect analysis Jan Hendrik Peters, Frederik Blumrich, Anthony Garetto, Thomas Scherübl 2018-08-21