Issued Patents All Time
Showing 26–50 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9366976 | Optical element with low surface figure deformation | — | 2016-06-14 |
| 9316930 | Low-contamination optical arrangement | Stefan Xalter | 2016-04-19 |
| 9316929 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more | 2016-04-19 |
| 9298111 | Optical arrangement in a projection exposure apparatus for EUV lithography | Viktor Kulitzki, Bernhard Gellrich, Stefan Xalter, Peter Deufel, Andreas Wurmbrand | 2016-03-29 |
| 9239229 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2016-01-19 |
| 9134632 | Lithographic apparatus and device manufacturing method | Marc Wilhelmus Maria Van Der Wijst, Hans Butler, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis +2 more | 2015-09-15 |
| 9097985 | Lens comprising a plurality of optical element disposed in a housing | — | 2015-08-04 |
| 9030647 | Optical imaging arrangement with vibration decoupled support units | Dick Antonius Hendrikus Laro | 2015-05-12 |
| 9019475 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-28 |
| 9013684 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-21 |
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2015-04-07 |
| 8964165 | Optical apparatus with adjustable action of force on an optical module | — | 2015-02-24 |
| 8885141 | EUV lithography device and method for processing an optical element | Wolfgang Singer, Stefan Schmidt, Dirk Heinrich Ehm, Dieter Kraus, Stefan Wiesner +3 more | 2014-11-11 |
| 8767176 | Microlithographic projection exposure apparatus | Sascha Bleidistel, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber | 2014-07-01 |
| 8717534 | Lens comprising a plurality of optical element disposed in a housing | — | 2014-05-06 |
| 8711331 | Optical module for a microlithography objective including holding and supporting devices | Jens Kugler, Franz Sorg | 2014-04-29 |
| 8587765 | Optical imaging device with determination of imaging errors | — | 2013-11-19 |
| 8570676 | Optical assembly | Hermann Bieg, Karl-Eugen Aubele, Stefan Xalter, Martin Schmidt, Saverio Sanvido +1 more | 2013-10-29 |
| 8416392 | Optical imaging arrangement | — | 2013-04-09 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka +6 more | 2012-12-25 |
| 8269947 | Optical system for semiconductor lithography | Frank Melzer, Stefan Xalter, Damian Fiolka | 2012-09-18 |
| 8089707 | Diaphragm changing device | Hermann Bieg, Marcus Will, Thomas C. Bischoff, Uy-Liem Nguyen, Stefan Xalter +1 more | 2012-01-03 |
| 8072700 | Optical apparatus for use in photolithography | Erik Roelof Loopstra | 2011-12-06 |
| 8065103 | Calibration of a position measuring device of an optical device | — | 2011-11-22 |
| 8018664 | Housing structure | Stefan Xalter, Peter Deufel, Bernard Stommen, Herman Soemers, Franz Van Deuren +1 more | 2011-09-13 |