Issued Patents All Time
Showing 26–50 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8928859 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Markus Schwab, Wolfgang Seitz, Olaf Dittmann | 2015-01-06 |
| 8891057 | Microlithographic projection exposure apparatus | Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Damian Fiolka +1 more | 2014-11-18 |
| 8873023 | Illumination system for microlithography | Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard +8 more | 2014-10-28 |
| 8811568 | Correction of optical elements by correction light irradiated in a flat manner | Sascha Bleidistel | 2014-08-19 |
| 8760744 | Correction of optical elements by correction light irradiated in a flat manner | Sascha Bleidistel | 2014-06-24 |
| 8730455 | Illumination system for a microlithographic projection exposure apparatus | Damian Fiolka, Axel Scholz, Markus Deguenther, Johannes Wangler, Vladimir Davydenko | 2014-05-20 |
| 8724086 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Damian Fiolka +1 more | 2014-05-13 |
| 8636386 | Filter device for the compensation of an asymmetric pupil illumination | Damian Fiolka | 2014-01-28 |
| 8513628 | EUV illumination system with a system for measuring fluctuations of the light source | Axel Scholz, Markus Weiss, Philipp Bosselmann | 2013-08-20 |
| 8480261 | Filter device for the compensation of an asymmetric pupil illumination | Damian Fiolka | 2013-07-09 |
| 8395756 | Illumination system for a microlithographic projection exposure apparatus | Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Markus Deguenther +4 more | 2013-03-12 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Johannes Eisenmenger, Damian Fiolka +6 more | 2012-12-25 |
| 8264668 | Illumination system of a microlithographic projection exposure apparatus | Damian Fiolka, Markus Schwab, Wolfgang Seitz, Olaf Dittmann | 2012-09-11 |
| 8246211 | Filter device for the compensation of an asymmetric pupil illumination | Damian Fiolka | 2012-08-21 |
| 8169594 | Illumination system of a microlithographic projection exposure apparatus | Nils Dieckmann, Christian Hettich, Oliver Natt | 2012-05-01 |
| 8068279 | Optical system of an illumination device of a projection exposure apparatus | Karl-Heinz Schuster, Juergen Hartmaier, Dieter Schmerek, Detlev Mueller, Otto Hahnemann +3 more | 2011-11-29 |
| 8025427 | Filter device for the compensation of an asymmetric pupil illumination | Damian Fiolka | 2011-09-27 |
| 8004656 | Illumination system for a microlithographic projection exposure apparatus | Damian Fiolka, Vladimir Davydenko, Axel Scholz, Markus Deguenther, Johannes Wangler | 2011-08-23 |
| 7995280 | Projection exposure system, beam delivery system and method of generating a beam of light | Matthias Kuss, Damian Fiolka, Gerd Reisinger, Vladimir Davydenko | 2011-08-09 |
| 7911584 | Illumination system for microlithography | Wolfgang Singer, Joachim Wietzorrek, Joachim Hainz, Gabriele Weirauch | 2011-03-22 |
| 7875865 | EUV illumination system with a system for measuring fluctuations of the light source | Axel Scholz, Markus Weiss, Philipp Bosselmann | 2011-01-25 |
| 7847920 | Illumination system and polarizer for a microlithographic projection exposure apparatus | Damian Fiolka, Axel Scholz | 2010-12-07 |
| 7798676 | Filter device for the compensation of an asymmetric pupil illumination | Damian Fiolka | 2010-09-21 |
| 7714983 | Illumination system for a microlithography projection exposure installation | Jess Koehler, Johannes Wangler, Markus Brotsack, Wolfgang Singer, Damian Fiolka | 2010-05-11 |
| 7593095 | System for reducing the coherence of laser radiation | Damian Fiolka, Nils Dieckmann | 2009-09-22 |