Issued Patents All Time
Showing 26–50 of 81 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9001309 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2015-04-07 |
| 8964162 | Optical assembly | Wilfried Clauss | 2015-02-24 |
| 8928859 | Illumination system of a microlithographic projection exposure apparatus | Manfred Maul, Markus Schwab, Wolfgang Seitz, Olaf Dittmann | 2015-01-06 |
| 8891057 | Microlithographic projection exposure apparatus | Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul +1 more | 2014-11-18 |
| 8861084 | Polarization-modulating optical element | Markus Deguenther | 2014-10-14 |
| 8767181 | Microlithographic exposure method as well as a projection exposure system for carrying out the method | Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack +4 more | 2014-07-01 |
| 8730455 | Illumination system for a microlithographic projection exposure apparatus | Manfred Maul, Axel Scholz, Markus Deguenther, Johannes Wangler, Vladimir Davydenko | 2014-05-20 |
| 8724086 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Michael Layh, Markus Deguenther, Michael Patra, Johannes Wangler, Manfred Maul +1 more | 2014-05-13 |
| 8711479 | Illumination apparatus for microlithography projection system including polarization-modulating optical element | Markus Deguenther | 2014-04-29 |
| 8636386 | Filter device for the compensation of an asymmetric pupil illumination | Manfred Maul | 2014-01-28 |
| 8625071 | Optical system and method for characterising an optical system | — | 2014-01-07 |
| 8587767 | Illumination optics for EUV microlithography and related system and apparatus | Berndt Warm, Christian Steigerwald, Martin Endres, Ralf Stuetzle, Jens Ossmann +6 more | 2013-11-19 |
| 8542356 | Measurement method and measurement system for measuring birefringence | Marc-Michel ROHÉ | 2013-09-24 |
| 8482717 | Polarization-modulating optical element | Markus Deguenther | 2013-07-09 |
| 8480261 | Filter device for the compensation of an asymmetric pupil illumination | Manfred Maul | 2013-07-09 |
| 8395753 | Microlithographic projection exposure apparatus | Michael Totzeck, Alexandra Pazidis, Michael Ricker | 2013-03-12 |
| 8339577 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger +6 more | 2012-12-25 |
| 8320043 | Illumination apparatus for microlithographyprojection system including polarization-modulating optical element | Markus Deguenther | 2012-11-27 |
| 8319945 | Illumination system of a microlithographic projection exposure apparatus | Vladan Blahnik | 2012-11-27 |
| 8289623 | Polarization-modulating optical element | Markus Deguenther | 2012-10-16 |
| 8279524 | Polarization-modulating optical element | Markus Deguenther | 2012-10-02 |
| 8270077 | Polarization-modulating optical element | Markus Deguenther | 2012-09-18 |
| 8269947 | Optical system for semiconductor lithography | Frank Melzer, Yim-Bun Patrick Kwan, Stefan Xalter | 2012-09-18 |
| 8264668 | Illumination system of a microlithographic projection exposure apparatus | Manfred Maul, Markus Schwab, Wolfgang Seitz, Olaf Dittmann | 2012-09-11 |
| 8259393 | Polarization-modulating optical element | Markus Deguenther | 2012-09-04 |