DF

Damian Fiolka

CG Carl Zeiss Smt Gmbh: 77 patents #7 of 1,189Top 1%
AB Asml Netherlands B.V.: 3 patents #1,156 of 3,192Top 40%
AN Asml Holding N.V.: 1 patents #312 of 520Top 60%
📍 Oberkochen, DE: #4 of 377 inventorsTop 2%
Overall (All Time): #22,250 of 4,157,543Top 1%
81
Patents All Time

Issued Patents All Time

Showing 76–81 of 81 patents

Patent #TitleCo-InventorsDate
7511886 Optical beam transformation system and illumination system comprising an optical beam transformation system Joerg Schultz, Markus Deguenther, Markus Brotsack, Gerhard Fuerter, Wolfgang Singer +2 more 2009-03-31
7408616 Microlithographic exposure method as well as a projection exposure system for carrying out the method Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack +4 more 2008-08-05
7408622 Illumination system and polarizer for a microlithographic projection exposure apparatus Axel Scholz, Manfred Maul 2008-08-05
7405808 Optical system, in particular illumination system, of a microlithographic projection exposure apparatus Toralf Gruner, Michael Totzeck, Wilhelm Ulrich, Gerhard Fuerter 2008-07-29
7345740 Polarized radiation in lithographic apparatus and device manufacturing method Christian Wagner, Wilhelmus Petrus De Boeij, Roel De Jonge, Tilmann Heil 2008-03-18
7312852 Polarized radiation in lithographic apparatus and device manufacturing method Christian Wagner, Wilhelmus Petrus De Boeij, Tilmann Heil 2007-12-25