Issued Patents All Time
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9310692 | Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus | Ralf Stuetzle, Jens Ossmann, Michael Layh | 2016-04-12 |
| 9304406 | Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography | Adrian Staicu | 2016-04-05 |
| 9304408 | Projection objective for microlithography | Johannes Zellner, Hans-Juergen Mann | 2016-04-05 |
| 9304400 | Illumination system for EUV microlithography | Michael Layh, Ralf Stuetzle, Damian Fiolka, Holger Weigand | 2016-04-05 |
| 9182578 | Imaging optical system and illumination optical system | Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Marco Pretorius, Christoph Menke +1 more | 2015-11-10 |
| 9164394 | Illumination optical system and optical systems for microlithography | — | 2015-10-20 |
| 9110378 | Illumination optical system for projection lithography | Jens Ossmann, Ralf Stuetzle | 2015-08-18 |
| 9063336 | Optical element having a plurality of reflective facet elements | Marc Kirch, Damian Fiolka, Joachim Hartjes | 2015-06-23 |
| 8937708 | Illumination optics for microlithography | Ralf Stuetzle, Jens Ossmann | 2015-01-20 |
| 8717541 | Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography | Adrian Staicu | 2014-05-06 |
| 8629972 | Projection objective for microlithography | Johannes Zellner, Hans-Juergen Mann | 2014-01-14 |
| 8587767 | Illumination optics for EUV microlithography and related system and apparatus | Damian Fiolka, Berndt Warm, Christian Steigerwald, Ralf Stuetzle, Jens Ossmann +6 more | 2013-11-19 |
| 8457281 | Method for producing a multilayer coating, optical element and optical arrangement | Hartmut Enkisch, Stephan Muellender | 2013-06-04 |
| 8395754 | Illumination optical unit for EUV microlithography | Sebastian Doern, Stig Bieling, Marc Kirch | 2013-03-12 |
| 8253925 | Catoptric illumination system for microlithography tool | Jens Ossmann, Ralf Stuetzle | 2012-08-28 |
| 8227770 | EUV illumination system | Jens Ossmann | 2012-07-24 |
| 8174677 | Illumination optical system for microlithography | Jens Ossmann, Ralf Stuetzle | 2012-05-08 |
| 7586113 | EUV illumination system | Jens Ossmann | 2009-09-08 |