Issued Patents All Time
Showing 26–50 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10459346 | Flows of optimization for lithographic processes | Rafael C. Howell, Xiaofeng Liu | 2019-10-29 |
| 10401732 | Optimization flows of source, mask and projection optics | Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen | 2019-09-03 |
| 10394131 | Image log slope (ILS) optimization | — | 2019-08-27 |
| 10386727 | Pattern placement error aware optimization | Jianjun Jia, Xiaofeng Liu, Cuiping Zhang | 2019-08-20 |
| 10331039 | Rule-based deployment of assist features | Kurt E. Wampler | 2019-06-25 |
| 10310386 | Optimization of assist features and source | Feng-Liang Liu | 2019-06-04 |
| 10025201 | Flows of optimization for lithographic processes | Rafael C. Howell, Xiaofeng Liu | 2018-07-17 |
| 9588438 | Optimization flows of source, mask and projection optics | Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen | 2017-03-07 |
| 8910091 | Method, program product and apparatus for performing double exposure lithography | Jang Fung Chen, Douglas Van Den Broeke | 2014-12-09 |
| 8644589 | Method and apparatus for performing model-based OPC for pattern decomposed features | Jungchul PARK, Doug Van Den Broeke, Jang Fung Chen | 2014-02-04 |
| 8632930 | Method and apparatus for performing dark field double dipole lithography (DDL) | Sangbong Park, Douglas Van Den Broeke, Jang Fung Chen | 2014-01-21 |
| 8629064 | Multiple patterning lithography using spacer and self-aligned assist patterns | Xiaoyang Li | 2014-01-14 |
| 8486589 | Lithographic processing method, and device manufactured thereby | Joobyoung Kim | 2013-07-16 |
| 8391605 | Method and apparatus for performing model-based OPC for pattern decomposed features | Jung Chul Park, Douglas Van Den Broeke, Jang Fung Chen | 2013-03-05 |
| 8182969 | Lithographic processing method, and device manufactured thereby | Joobyoung Kim | 2012-05-22 |
| 8132130 | Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process | Jang Fung Chen, Douglas Van Den Broeke, Thomas Laidig | 2012-03-06 |
| 8122391 | Method, program product and apparatus for performing double exposure lithography | Jang Fung Chen, Douglas Van Den Broeke | 2012-02-21 |
| 8111921 | Method and apparatus for performing model-based OPC for pattern decomposed features | Jung Chul Park, Douglas Van Den Broeke, Jang Fung Chen | 2012-02-07 |
| 7985515 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran | 2011-07-26 |
| 7981576 | Method and apparatus for performing dark field double dipole lithography (DDL) | Sangbong Park, Douglas Van Den Broeke, Jang Fung Chen | 2011-07-19 |
| 7892703 | CPL mask and a method and program product for generating the same | Jang Fung Chen, Douglas Van Den Broeke, Jung Chul Park, Thomas Laidig | 2011-02-22 |
| 7824826 | Method and apparatus for performing dark field double dipole lithography (DDL) | Sangbong Park, Douglas Van Den Broeke, Jang Fung Chen | 2010-11-02 |
| 7735052 | Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs | Xuelong Shi, Jang Fung Chen | 2010-06-08 |
| 7681171 | Method, program product and apparatus for performing double exposure lithography | Jang Fung Chen, Douglas Van Den Broeke | 2010-03-16 |
| 7666554 | Method and apparatus for performing model-based layout conversion for use with dipole illumination | Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran | 2010-02-23 |