Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10846442 | Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration | Jun Ye, Yu Cao, Wenjin Shao | 2020-11-24 |
| 10424396 | Computation pipeline of location-dependent variant calls | Jun Ye, Wei Zhou, Luoqi Chen, Hong Chen, Xiaofeng Liu | 2019-09-24 |
| 10423075 | Methods and systems for pattern design with tailored response to wavefront aberration | Yu Cao, Jun Ye, Youping Zhang | 2019-09-24 |
| 10424395 | Computation pipeline of single-pass multiple variant calls | Jun Ye, Wei Zhou, Luoqi Chen, Hong Chen, Xiaofeng Liu | 2019-09-24 |
| 10401732 | Optimization flows of source, mask and projection optics | Duan-Fu Stephen Hsu, Luoqi Chen, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen | 2019-09-03 |
| 10310371 | Method and system for lithography process-window-maximizing optical proximity correction | Jun Ye, Yu Cao | 2019-06-04 |
| 10169522 | Methods and system for model-based generic matching and tuning | Yu Cao, Jun Ye | 2019-01-01 |
| 10025885 | Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration | Jun Ye, Yu Cao, Wenjin Shao | 2018-07-17 |
| 10025198 | Smart selection and/or weighting of parameters for lithographic process simulation | Yu Cao, Wenjin Shao, Fei Du, Martin Snajdr | 2018-07-17 |
| 9779186 | Methods for performing model-based lithography guided layout design | Jun Ye, Yu Cao | 2017-10-03 |
| 9619603 | Optimization of source, mask and projection optics | Yu Cao, Jun Ye | 2017-04-11 |
| 9588438 | Optimization flows of source, mask and projection optics | Duan-Fu Stephen Hsu, Luoqi Chen, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen | 2017-03-07 |
| 9390206 | Methods and systems for lithography process window simulation | Jun Ye, Yu Cao | 2016-07-12 |
| 9378309 | Pattern-independent and hybrid matching/tuning including light manipulation by projection optics | Yu Cao, Jun Ye | 2016-06-28 |
| 9360766 | Method and system for lithography process-window-maximixing optical proximity correction | Jun Ye, Yu Cao | 2016-06-07 |
| 9009647 | Methods and systems for lithography calibration using a mathematical model for a lithographic process | Jun Ye, Yu Cao | 2015-04-14 |
| 8930172 | Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration | Jun Ye, Yu Cao, Wenjin Shao | 2015-01-06 |
| 8918742 | Methods and systems for pattern design with tailored response to wavefront aberration | Yu Cao, Jun Ye, Youping Zhang | 2014-12-23 |
| 8893058 | Methods and system for model-based generic matching and tuning | Yu Cao, Jun Ye | 2014-11-18 |
| 8893060 | Optimization of source, mask and projection optics | Yu Cao, Jun Ye | 2014-11-18 |
| 8806394 | Pattern-dependent proximity matching/tuning including light manipulation by projection optics | Yu Cao, Jun Ye | 2014-08-12 |
| 8745551 | Pattern-independent and hybrid matching/tuning including light manipulation by projection optics | Yu Cao, Jun Ye | 2014-06-03 |
| 8732625 | Methods for performing model-based lithography guided layout design | Jun Ye, Yu Cao | 2014-05-20 |
| 8560978 | Pattern-dependent proximity matching/tuning including light manipulation by projection optics | Yu Cao, Jun Ye | 2013-10-15 |
| 8542340 | Illumination optimization | Jun Ye, Yu Cao | 2013-09-24 |