Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5023164 | Highly sensitive dry developable deep UV photoresist | William R. Brunsvold, Philip Chiu, Willard E. Conley, Melvin Montgomery, Wayne M. Moreau | 1991-06-11 |
| 4939070 | Thermally stable photoresists with high sensitivity | William R. Brunsvold, Ming-Fea Chow, Willard E. Conley, Jean M. J. Frechet, George J. Hefferon +3 more | 1990-07-03 |
| 4931379 | High sensitivity resists having autodecomposition temperatures greater than about 160.degree. C. | William R. Brunsvold, Willard E. Conley, Nancy Iwamoto | 1990-06-05 |